HF and Hydrazine Monohydrate Solution Treatment for Suppressing Oxidation of ZrN Film Surface : Surfaces. Interfaces, and Films
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概要
- 論文の詳細を見る
Because the surface of a ZrN film was easily oxidized even immediately after the deposition, we did not obtain heteroepitaxial Ir film on the epitaxial ZrN film. In order to remove the oxidized layer from the ZrN film and suppress the oxidation, we propose a novel wet chemical treatment using HF and hydrazine (N_2H_4) monohydrate solution before the Ir film deposition. From the treated ZrN film surface, the X-ray photoelectron spectroscopy (XPS) spectrum showed the decrease of the oxide signal of the Zr_3d spectrum. Moreover, on the treated epitaxial (100)ZrN film on the (100)Si substrate, we obtained the (100) epitaxial Ir film.
- 社団法人応用物理学会の論文
- 2001-09-15
著者
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Horita Susumu
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Toda Takeo
School Of Material Science Japan Advanced Institute Of Science And Technology
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Horii Sadayoshi
School Of Material Science Japan Advanced Institute Of Science And Technology
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