Heteroepitaxial Growth of Yttria-Stabilized Zirconia Film on Silicon by Reactive Sputtering

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1995-04-15

著者

• Horita Susumu

  School Of Materials Science Japan Advanced Institute Of Science And Technology

• Murakawa Masakazu

  Faculty of Technology, Kanazawa University

• Fujiyama Takaharu

  Faculty of Technology, Kanazawa University

• Murakawa Masakazu

  Faculty Of Technology Kanazawa University:(present Address)nippon Kokan K.k.

• Fujiyama Takaharu

  Faculty Of Technology Kanazawa University:(present Address)intel Japan K.k.

関連論文

• Increase of Dielectric Constant of an Epitaxial (100) Yttria-Stabilized Zirconia Film on (100) Si Substrate Deposited by Reactive Sputtering in the Metallic Mode : Surfaces, Interfaces, and Films
• Low Temperature Heteroepitaxial Growth of a New Phase Lead Zirconate Titanate Film on Si Substrate with an Epitaxial(ZrO_2)_(Y_2O_3)_x Buffer Layer
• Material Properties of Heteroepitaxial Ir and Pb (Zr_xTi_) O_3 Films on (100) (ZrO_2)_(Y_2O_3)_x/(100) Si Structure Prepared by Sputtering
• Characterization of Pb(Zr_xTi_)O_3 Thin Film on Silicon Substrate with Heteroepitaxial Yttria-Stabilized Zirconia (YSZ) Buffer Layer
• Low Voltage Saturation of Ob(Zr_xTi_O_3 Films on(100)Ir/(100)(ZrO_2)_(Y_2O_3)_x/(100)Si Substrate Structure Prepared by Reactive Sputtering
• Enhancement of Crystallization of an Si Film on a Quartz Substrate by Thermal Electron Irradiation : Surfaces, Interfaces, and Films
• Epitaxial Growth of a (101) Pb(Zr_xTi_)O_3 Film on an Epitaxial (110) Ir/(100) ZrN/(100) Si Substrate Structure
• Epitaxial Pt Films with Different Orientations Grown on (100)Si Substrates by RF Magnetron Sputtering
• Heteroepitaxial Growth of Yttria-Stabilized Zirconia Film on Silicon by Reactive Sputtering
• Gate Voltage Reduction of a Ferroelectric Gate Field-Effect Transistor Memory with an Intermediate Electrode on Data-Reading
• Novel Si Nanodisk Fabricated by Biotemplate and Defect-Free Neutral Beam Etching for Solar Cell Application
• HF and Hydrazine Monohydrate Solution Treatment for Suppressing Oxidation of ZrN Film Surface : Surfaces. Interfaces, and Films
• Low-Temperature Crystallization of Silicon Films Directly Deposited on Glass Substrates Covered with Yttria-Stabilized Zirconia Layers
• Low-Temperature Deposition of Silicon Oxide Film from the Reaction of Silicone Oil Vapor and Ozone Gas
• Epitaxial Pt Films with Different Orientations Grown on (100)Si Substrates by RF Magnetron Sputtering
• Gate Voltage Reduction of a Ferroelectric Gate Field-Effect Transistor Memory with an Intermediate Electrode on Data-Reading
• Material Properties of Heteroepitaxial Ir and Pb(ZrxTi1-x)O3 Films on (100)(ZrO2)1-x(Y2O3)x/(100)Si Structure Prepared by Sputtering

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