Epitaxial Growth of a (101) Pb(Zr_xTi_<1-x>)O_3 Film on an Epitaxial (110) Ir/(100) ZrN/(100) Si Substrate Structure
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-11-30
著者
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Horita Susumu
School Of Materials Science Japan Advanced Institute Of Science And Technology
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TODA Takeo
School of Materials Science, Japan Advanced Institute of Science and Technology
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KASAGAWA Hiroshi
School of Materials Science, Japan Advanced Institute of Science and Technology
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Toda Takeo
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Toda Takeo
School Of Material Science Japan Advanced Institute Of Science And Technology
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Kasagawa Hiroshi
School Of Materials Science Japan Advanced Institute Of Science And Technology
関連論文
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- Low Temperature Heteroepitaxial Growth of a New Phase Lead Zirconate Titanate Film on Si Substrate with an Epitaxial(ZrO_2)_(Y_2O_3)_x Buffer Layer
- Material Properties of Heteroepitaxial Ir and Pb (Zr_xTi_) O_3 Films on (100) (ZrO_2)_(Y_2O_3)_x/(100) Si Structure Prepared by Sputtering
- Characterization of Pb(Zr_xTi_)O_3 Thin Film on Silicon Substrate with Heteroepitaxial Yttria-Stabilized Zirconia (YSZ) Buffer Layer
- Low Voltage Saturation of Ob(Zr_xTi_O_3 Films on(100)Ir/(100)(ZrO_2)_(Y_2O_3)_x/(100)Si Substrate Structure Prepared by Reactive Sputtering
- Enhancement of Crystallization of an Si Film on a Quartz Substrate by Thermal Electron Irradiation : Surfaces, Interfaces, and Films
- Epitaxial Growth of a (101) Pb(Zr_xTi_)O_3 Film on an Epitaxial (110) Ir/(100) ZrN/(100) Si Substrate Structure
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- Heteroepitaxial Growth of Yttria-Stabilized Zirconia Film on Silicon by Reactive Sputtering
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- Novel Si Nanodisk Fabricated by Biotemplate and Defect-Free Neutral Beam Etching for Solar Cell Application
- HF and Hydrazine Monohydrate Solution Treatment for Suppressing Oxidation of ZrN Film Surface : Surfaces. Interfaces, and Films
- Low-Temperature Crystallization of Silicon Films Directly Deposited on Glass Substrates Covered with Yttria-Stabilized Zirconia Layers
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