Two-Phase Structure of a-Si_<1-x>N_x:H Fabricated by Microwave Glow-Discharge Technique

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1985-01-20

著者

• OSAKA Yukio

  Department of Electrical Engineering, Hiroshima University

• HAMASAKI Toshihiko

  Department of Electrical Engineering, Hiroshima University

• Ueda M

  Univ. Tokushima Tokushima Jpn

• Ueda M

  The Institute Of Scientific And Industrial Research Osaka University

• UEDA Masato

  Department of Applied Chemistry, Faculty of Engineering, Osaka Institute of Technology

• CHAYAHARA Akiyoshi

  Department of Electrical Engineering, Faculty of Engineering, Hiroshima University

• Chayahara Akiyoshi

  Department Of Electrical Engineering Hiroshima University

• Osaka Y

  Hiroshima Kokusaigakuin Univ. Hiroshima Jpn

• Osaka Yukio

  Department Of Electrical Engineering Faculty Of Engineering Hiroshima University

• Hamasaki T

  Okayama Univ. Science Okayama

• Ueda Masahiro

  Department Of Techniques Faculty Of Education Fukui University

• Hamasaki Toshihiko

  Department Of Electrical Engineering Hiroshima University

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