Quantum Size Effect and HRTEM Observation of CdSe Microcrystallites Doped into SiO_2-Glass Films Prepared by Rf-Sputtering

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概要

• 論文の詳細を見る
• 1990-11-20

著者

• OSAKA Yukio

  Department of Electrical Engineering, Hiroshima University

• NASU Hiroyuki

  Department of Chemistry for Materials, Faculty of Engineering, Mie University

• Osaka Y

  Department Of Electrical Engineering Hiroshima-denki Institute Of Technology

• Osaka Y

  Hiroshima Kokusaigakuin Univ. Hiroshima Jpn

• Osaka Yukio

  Department Of Electrical Engineering Faculty Of Engineering Hiroshima University

• Nasu Hiroyuki

  Department Of Chemistry For Materials Faculty Of Engineering Mie University

• KURIBAYASHI Hiromitsu

  WaferMasters, Inc.

• Tsunetomo K

  Nippon Sheet Glass Co. Ltd. Ibaraki Jpn

• TSUNETOMO Keiji

  Department of Electrical Engineering, Faculty of Engineering, Hiroshima University

• Kawabuchi Akira

  Department of Electrical Engineering, Faculty of Engineering, Hiroshima University

• KITAYAMA Haruyuki

  Department of Electrical Engineering, Faculty of Engineering, Hiroshima University

• Kitayama Haruyuki

  Wafermasters Inc.

• Kawabuchi Akira

  Department Of Electrical Engineering Faculty Of Engineering Hiroshima University

• OSAKA Yukio

  Department of Electrical Engineering, Faculty of Engineering, Hiroshima University

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• A New Technique of Boron Doping in Si:H Films
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• Microcrystallization in P-Doped Si:H Films at High Deposition Rate
• Photoinduced Absorption on Phosphorus and Nitrogen Doped a-Si:H Films Prepared at High Deposition-Rate
• Proton Nuclear Magnetic Resonance Studies on Structural Changes Induced by Annealing of Hydrogenated Amorphous Silicon Films Prepared at High Deposition-Rate
• Effect of Annealing on Photoinduced Absorption in Amorphous Silicon Films Prepared at High Deposition Rates
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