Tsunetomo K | Nippon Sheet Glass Co. Ltd. Ibaraki Jpn
スポンサーリンク
概要
関連著者
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OSAKA Yukio
Department of Electrical Engineering, Hiroshima University
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Osaka Y
Department Of Electrical Engineering Hiroshima-denki Institute Of Technology
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Osaka Yukio
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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Tsunetomo K
Nippon Sheet Glass Co. Ltd. Ibaraki Jpn
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TSUNETOMO Keiji
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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OSAKA Yukio
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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Osaka Y
Hiroshima Kokusaigakuin Univ. Hiroshima Jpn
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YAMAMOTO Masaki
Department of Chemistry, Faculty of Science, Okayama University
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Kohno Kenji
Department Of Electrical Engineering Hiroshima-denki Institute Of Technology
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NASU Hiroyuki
Department of Chemistry for Materials, Faculty of Engineering, Mie University
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Nasu Hiroyuki
Department Of Chemistry For Materials Faculty Of Engineering Mie University
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Kohno K
Hiroshima Kokusaigakuin Univ. Hiroshima Jpn
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Yamamoto Masaki
Department Of Cardiovascular Surgery Chiba Cardiovascular Center
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山本 雅彦
阪大工
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HAYASHI Ryo
Department of Chemistry, Faculty of Science and Engineering, Saga University
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Yamamoto Masanobu
Sony Corp. Tokyo Jpn
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Yamamoto M
Ntt System Electrics Lab. Kanagawa Jpn
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Hayashi Ryo
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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Hayashi Ryo
Department Of Advanced Prosthodontics Division Of Cervico-gnathostomatology Programs For Applied Bio
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IMURA Takeshi
Department of Electrical Engineering, Osaka University
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Imura T
Mitsubishi Paper Mills Ltd.
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Imura T
Department Of Electrical Engineering Hiroshima University
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Imura Takeshi
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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KURIBAYASHI Hiromitsu
WaferMasters, Inc.
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Kawabuchi Akira
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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Kitayama Haruyuki
Wafermasters Inc.
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Kawabuchi Akira
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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MYOREN Hiroaki
Department of Electrical Engineering, Hiroshima University
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Myoren Hiroaki
Department Of Electrical And Electronic Systems Faculty Of Engineering Saitama University
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TOKUMITSU Yoji
Department of Electrical Engineering, Hiroshima University
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TOYOMURA Fumitaka
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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Shimizu Ryuichiro
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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Kitayama Hayuyuki
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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KITAYAMA Haruyuki
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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FUKUMOTO Hirofumi
Department of Electrical Engineering, Hiroshima University
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SUGISHIMA Tatsumi
Department of Electrical Engineering,Hiroshima University
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Shimizu Ryuichiro
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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Tokumitsu Yoji
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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Toyomura Fumitaka
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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Fukumoto Hirofumi
Department Of Electrical Engineering Hiroshima University
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Sugishima Tatsumi
Department Of Electrical Engineering Hiroshima University
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Imura Takeshi
Department of Chemistry, Faculty of Engineering Science, Osaka University
著作論文
- Quantum Size Effect and HRTEM Observation of CdSe Microcrystallites Doped into SiO_2-Glass Films Prepared by Rf-Sputtering
- Visible Photoluminescence from Si Microcrystals Embedded in SiO_2 Glass Films
- Preparation and Properties of Si Microcrystals Embedded in SiO_2 Glass Films
- Preparation and Properties of Ge Microcrystals Embedded in SiO_2 Glass Films
- Structural Changes of Amorphous GeTe_2 Films by Annealing (Formation of Metastable Crystalline GeTe_2 Films)
- CuCl Microcrystallite-Doped SiO_2 Glass Thin Films Prepared by RF Sputtering
- Preparation and Properties of In_xGa_As Microcrystallites Embedded in SiO_2 Glass Films
- Semiconducting CdTe Microcrystalline-Doped SiO_2 Glass Thin Films Prepared by Rf-Sputtering
- Effects of Film Thickness and Substrate-Film Interface on the Formation of Metastable Crystalline GeTe_2 from Amorphous GeTe_2 Film