Characterization of Diamond Particles and Films Formed by Plasma-Assisted Chemical Vapour Deposition Using High-Voltage Electron Microscopy
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1987-11-20
著者
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MORI Hirotaro
Research Center for Ultrahigh Voltage Electron Microscopy, Osaka University
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Kawarada Hiroshi
School Of Science & Engineering Waseda University
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ITO Toshimichi
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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Suzuki J
Tokyo Inst. Technol. Tokyo Jpn
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Mar King
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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HIRAKI Akio
Faculty of Engineering, Osaka University
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Hiraki Akio
Faculty Of Engineering Osaka University
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Suzuki J
Tohoku Univ. Sendai Jpn
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KAWARADA Hiroshi
Faculty of Engineering, Osaka,University
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ITO Toshimichi
Planning and Development Center, Idemitsu Petrochemical Co. Ltd.
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SUZUKI Jun-ichi
Faculty of Engineering, Osaka,University
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MAR King
Faculty of Engineering, Osaka University
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FUJITA Hiroshi
Research Center for Ultra-High-Voltage Electron Microscopy, Osaka University
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Kawarada H
School Of Science And Engineering Waseda University
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Suzuki Jun-ichi
Industrial Machinery Division Shimadzu Corp.
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Mori Hirotaro
Research Center For Ultra-high Voltage Electron Microscopy Osaka University
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Mori Hirotaro
Research Center For Ultra-high-voltage Electron Microscopy Osaka University
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Ito Toshimichi
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Kawarada Hiroshi
Nanotechnology Research Center Waseda University
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Fujita Hiroshi
Research Center For Ultra-high-voltage Electron Microscopy Osaka University
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Fujita Hiroshi
Research Center For Uhvem Osaka University:(present Address)kinki University
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Ito Toshimichi
Planning And Development Department Idemitsu Petrochemical Co. Ltd.
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