Preparation of Amorphous Hydrogenated Carbon Films by RF Sputtering at a Low-Hydrogen-Flow-Rate Region for Hydrogen-Reactive Substrates
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-05-15
著者
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Hiraki A
Faculty Of Engineering University Of The Ryukyus
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Higa Akira
Faculty Of Engineering University Of The Ryukyus
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Toguchi M
Faculty Of Engineering University Of The Ryukyus
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Toguchi Minoru
Faculty Of Engineering University Of The Ryukyus
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OSHIRO Takehiko
Faculty of Engineering, University of the Ryukyus
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YAMAZATO Masaaki
Faculty of Engineering, University of the Ryukyus
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MAEHAMA Takehiro
Faculty of Engineering, University of the Ryukyus
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