MAEHAMA Takehiro | Faculty of Engineering, University of the Ryukyus

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概要

• MAEHAMA Takehiroの詳細を見る
• 同名の論文著者
• Faculty of Engineering, University of the Ryukyusの論文著者

関連著者

• Hiraki A

  Faculty Of Engineering University Of The Ryukyus

• Higa Akira

  Faculty Of Engineering University Of The Ryukyus

• Toguchi M

  Faculty Of Engineering University Of The Ryukyus

• Toguchi Minoru

  Faculty Of Engineering University Of The Ryukyus

• MAEHAMA Takehiro

  Faculty of Engineering, University of the Ryukyus

• YAMAZATO Masaaki

  Faculty of Engineering, University of the Ryukyus

• OHNO Ryoichi

  Acrorad Co., Ltd.

• Maehama Takehiro

  Univ. Of The Ryukyus Okinawa Jpn

• Maehama Takehiro

  Faculty Of Engineering University Of The Ryukyus

• ITO Toshimichi

  Department of Electrical Engineering, Faculty of Engineering, Osaka University

• OSHIRO Takehiko

  Faculty of Engineering, University of the Ryukyus

• TOYAMA Hiroyuki

  Faculty of Engineering, University of the Ryukyus

• NISHIHIRA Atsushi

  Faculty of Engineering, University of the Ryukyus

• MIURA Tatsuhiko

  Faculty of Engineering, University of the Ryukyus

• HATTA Akimitsu

  Faculty of Engineering, Osaka University

• ITO Toshimichi

  Faculty of Engineering, Osaka University

• HIRAKI Akio

  Faculty of Engineering, Osaka University

• Hiraki Akio

  Faculty Of Engineering Osaka University

• Ohno Ryoichi

  Acrorad Co. Ltd. Okinawa Jpn

• Ito Toshimichi

  Department Of Electrical Engineering Faculty Of Engineering Osaka University:cooperative Research Ce

• Ito Toshimichi

  Department Of Electrical Engineering Faculty Of Engineering Osaka University

• Miura Tatsuhiko

  Faculty Of Engineering University Of The Ryukyus

• Ohno Ryoichi

  Acrorad Co. Ltd.

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著作論文

• Formation of Aluminum Schottky Contact on Plasma-Treated Cadmium Telluride Surface
• Preparation of Amorphous Hydrogenated Carbon Films by RF Sputtering at a Low-Hydrogen-Flow-Rate Region for Hydrogen-Reactive Substrates
• Formation of Surface Oxide Layer on CdTe and Reduction of Surface Leakage Current by Inductively Coupled O_2 Plasma Treatment
• Homoepitaxial Diamond Synthesis by DC Arc Plasma Jet Chemical Vapor Deposition

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