OHNO Ryoichi | Acrorad Co., Ltd.

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概要

• OHNO Ryoichiの詳細を見る
• 同名の論文著者
• Acrorad Co., Ltd.の論文著者

関連著者

• Hiraki A

  Faculty Of Engineering University Of The Ryukyus

• Higa Akira

  Faculty Of Engineering University Of The Ryukyus

• Toguchi M

  Faculty Of Engineering University Of The Ryukyus

• Toguchi Minoru

  Faculty Of Engineering University Of The Ryukyus

• OHNO Ryoichi

  Acrorad Co., Ltd.

• YAMAZATO Masaaki

  Faculty of Engineering, University of the Ryukyus

• TOYAMA Hiroyuki

  Faculty of Engineering, University of the Ryukyus

• MAEHAMA Takehiro

  Faculty of Engineering, University of the Ryukyus

• Ohno Ryoichi

  Acrorad Co. Ltd. Okinawa Jpn

• Ohno Ryoichi

  Acrorad Co. Ltd.

• FUKUHARA Yasumasa

  Faculty of Engineering, University of the Ryukyus

• YAMANOHA Satoru

  Faculty of Engineering, University of the Ryukyus

• OWAN Ikumi

  Faculty of Engineering, University of the Ryukyus

• NISHIHIRA Atsushi

  Faculty of Engineering, University of the Ryukyus

• MIURA Tatsuhiko

  Faculty of Engineering, University of the Ryukyus

• Maehama Takehiro

  Univ. Of The Ryukyus Okinawa Jpn

• Miura Tatsuhiko

  Faculty Of Engineering University Of The Ryukyus

• Yamanoha Satoru

  Faculty Of Engineering University Of The Ryukyus

• Toyama Hiroyuki

  Faculty Of Engineering University Of The Ryukyus

• Maehama Takehiro

  Faculty Of Engineering University Of The Ryukyus

• Owan Ikumi

  Faculty Of Engineering University Of The Ryukyus

• Fukuhara Yasumasa

  Faculty Of Engineering University Of The Ryukyus

• Yamazato Masaaki

  Faculty Of Engineering University Of The Ryukyus

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著作論文

• Improvement in γ-ray Detection Quality of Al/CdTe/Pt Schottky-Type Radiation Detector by Sulfur Treatment
• Formation of Aluminum Schottky Contact on Plasma-Treated Cadmium Telluride Surface
• Formation of Surface Oxide Layer on CdTe and Reduction of Surface Leakage Current by Inductively Coupled O_2 Plasma Treatment

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