Impurity Effects in Chalcogenide Amorphous Semiconductors by Low-Temperature Diffusion of Metal Ions

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1984-10-20

著者

• HIRAKI Akio

  Faculty of Engineering, Osaka University

• Hiraki Akio

  Faculty Of Engineering Osaka University

• IMURA Takeshi

  Faculty of Engineering, Osaka University

• Okano Shuichi

  Faculty of Technology, Kanazawa University

• Suzuki Akio

  Faculty of Technology, Kanazawa University

• Fukada Noboru

  Central Research Laboratory, Kanegafuchi Chemical Industry Co., Ltd.

• Hiraki A

  Kochi Univ. Technol. Kochi‐ken Jpn

• Fukada N

  Kanegafuchi Chemical Industry Co. Ltd. Kobe Jpn

• Fukada Noboru

  Central Research Laboratories Kanegafuchi Chemical Industry Co. Ltd.

• Okano S

  Department Of Electrical And Computer Engineering Kanazawa University

• Okano Shuichi

  Faculty Of Engineering Kanazawa University

• Imura T

  Mitsubishi Paper Mills Ltd.

• Imura T

  Department Of Electrical Engineering Hiroshima University

• Imura Takeshi

  Faculty Of Engineering Osaka University

• Suzuki Akio

  Faculty Of Science Tohoku University

• Suzuki Akio

  Faculty Of Technology Kanazawa University

• Suzuki Akio

  Faculity of Engineering, University of Miyazaki, Miyazaki 889-2192, Japan

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