Miyasato Tatsuro | The Institute Of Scientific And Industrial Research Osaka University
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概要
関連著者
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Miyasato Tatsuro
The Institute Of Scientific And Industrial Research Osaka University
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MIYASATO Tatsuro
The Institute of Scientific and Industrial Research, Osaka University
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Tokumura Masao
The Institute Of Scientific And Industrial Research Osaka University
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Hiraki Akio
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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HIRAKI Akio
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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ABE Yuji
Department of Surgery, Kitakyushu Municipal Medical Center
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IMURA Takeshi
Department of Electrical Engineering, Osaka University
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Abe Yuji
Department Of Obstetrics And Gynecology Toho University School Of Medicine
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Imura Takeshi
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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KAWAKAMI Youichi
Department of Electrical Engineering, Osaka University
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KAWANO Toshifumi
Department of Electrical Engineering, Osaka University
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Kawano Toshifumi
Department Of Electrical Engineering Osaka University
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Tokumura M
The Institute Of Scientific And Industrial Research Osaka University
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Sakurai Hiromi
Department Of Analytical And Bioinorganic Chemistry Kyoto Pharmaceutical University
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HASHIMOTO Shin
Department of Electrical Engineering, Osaka University
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Suzuki Katsuo
The Institute Of Scientific And Industrial Research Osaka University
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Kawakami Youichi
Department Of Electrical Engineering Osaka University
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Abe Yuji
Department Of Chest Surgery Kitakyushu Municipal Medical Center
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Abe Yuji
Department Of Electrical Engineering Osaka University
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Abe Yuji
Department Of Biofunctional Research National Institutefor Longeviiy Sciences
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Hashimoto Shin
Department Of Electrical Engineering Osaka University
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TOKUMURA Masao
The Institute of Scientific and Industrial Research, Osaka University
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Imura Takeshi
Department of Chemistry, Faculty of Engineering Science, Osaka University
著作論文
- Preparation of sp^3-Rich Amorphous Carbon Film by Hydrogen Gas Reactive RF-Sputtering of Graphite, and Its Properties
- Fabrication of Si:H Alloy with Plenty of -SiH_3 by Reactive Sputtering onto Low Temperature Substrate
- Effect of Electrical Conductivity of Substrate on RF-Sputter-Deposition of μc-Si:H at -180℃
- Ultrasonic Attenuation in n-Type Ge.III.Effects of Magnetic Field
- Anomalous Behavior of Acoustic Attenuation in Ge:Sb under [001] Magnetic Field
- Heat-Pulse Scattering in P-Doped Ge under Magnetic Field
- Ballistic Heat-Pulse Transport in Sb-Doped Ge under Magnetic Field