High-Resolution Proximity Exposure through a Phase Shifter Mask
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概要
- 論文の詳細を見る
A simple method to fabricate fine lines of photoresist has been developed. The method utilizes a mask containing an equal-width line-and-space pattern of the half-wavelength phase shifter. A film of photoresist formed on a substrate is placed in close proximity to the mask and exposed through the mask by flooding with a beam of light. The beam, diffracted by the mask, produces an interference pattern, which extends long enough to expose the film patternwise. The film is then developed to form a resist pattern. An array of 0.2-μm-spaced, 0.1-μm-wide lines of a positive photoresist has been obtained by this method using the i-line with a peak intensity at the wavelength of 0.365 μm. Calculation based on a rigorous solution of the two-dimensional diffraction problem indicates that a high-contrast 0.1 μm line-and-space exposure using the i-line is feasible if the light is polarized.
- 社団法人応用物理学会の論文
- 1993-10-15
著者
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Imai Akira
Device Development Center Hitachi Ltd.
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IMAI Akira
Central Research Laboratory, Hitachi Ltd.
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NONOGAKI Saburo
Central Research Laboratory, Hitachi Ltd.
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Nonogaki Saburo
Central Research Laboratory Hitachi Ltd.
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Imai Akira
Central Research Laboratory Hitachi Ltd
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NONOGAKI Saburo
Central Research Laboratory, Hitachi, Ltd.
関連論文
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- Proposal for the Coma Aberration Dependent Overlay Error Compensation Technology
- High-Resolution Proximity Exposure through a Phase Shifter Mask
- Mask Fabrication with Submicron Line-Width by Electron Beam
- Fine Chromium Grating Directly Made by Irradiating Electron Beam
- Novel Process for Direct Delineation of Spin on Glass (SOG) : Resist Material and Process
- A Rigorous Solution of Two-Dimensional Diffraction Based on the Huygens-Fresnel Principle