Charge Modeling for Metal Layer on Insulating Substrate

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概要

• 論文の詳細を見る

• A charging model for magnification variation in the observation of a metal pattern on an insulating substrate using a scanning electron microscope is proposed. To calculate the time evolution of charging, we replace electron trajectory with current. Negative charging of the metal layer is observed and is caused by the current from the anode, which is set above the sample, to the metal layer. The origin of the current is tertiary electrons produced by backscattered electrons colliding with the anode. By controlling tertiary-electron trajectories through the application of bias voltage to the anode, the magnification variation can be reduced to almost zero.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2011-06-25

著者

• Sohda Yasunari

  Central Research Laboratory Hitachi Ltd.

• Okai Nobuhiro

  Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan

• Yano Tasuku

  Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan

• Sohda Yasunari

  Central Research Lab., Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan

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