Optical In Situ Observation of Electron Beam Induced Surface Modification of Epitaxial Fluoride Films
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概要
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An in situ optical observation method for investigations of fluoride surface modification induced by electron irradiation was developed for the purpose of improving the heteroepitaxy of semiconductors on fluorides. Spectra of reflected light after the electron irradiation and continuous intensity change of reflected light at a fixed wavelength during the electron irradiation were observed. It was found that a Ca colloidal absorption band at around 580 nm due to aggregation of Ca atoms appeared as the electron dose to the CaF_2 surface was increased. Progressive P atom adsorption during the electron irradiation was also observed in the case of use of a probing light of 400 nm wavelength. The amount of adsorbed P atoms increased as the electron dose increased and saturated at approximately one atomic monolayer on the CaF_2 surface. Elects of the acceleration energy of electrons on the surface modification were also investigated and it was found that the efficiency of P adsorption increased as the electron energy increased, while that of Ca aggregation decreased. A possible mechanism of this phenomenon is discussed.
- 社団法人応用物理学会の論文
- 1997-05-15
著者
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Kawasaki Koji
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Tsutsui Kazuo
Interdisciplinary Graduate School Of Science & Engineering Tokyo Institute Of Technology
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Tomisaka Manabu
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology:(present
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