Reactive Ion Etched II-VI Quantum Dots: Dependence of Etched Profile on Pattern Geometry
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-12-30
著者
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HU Evelyn
Department of Electrical and Computer Engineering, University of California
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TSUTSUI Kazuo
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Hu Evelyn
Department Of Electrical And Computer Engineering University Of California
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Hu E
Univ. California Ca Usa
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WILKINSON Chris
Department of Electronics and Electrical Engineering, University of Glasgow
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Tsutsui Kazuo
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Tsutsui Kazuo
Interdisciplinary Graduate School Of Science & Engineering Tokyo Institute Of Technology
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Wilkinson Chris
Department Of Electronics And Electrical Engineering University Of Glasgow
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