Vacancy-Boron Complexes in Plasma Immersion Ion-Implanted Si Probed by a Monoenergetic Positron Beam
スポンサーリンク
概要
- 論文の詳細を見る
Vacancy-type defects in plasma immersion B-implanted Si were probed by a monoenergetic positron beam. Doppler broadening spectra of the annihilation radiation were measured and compared with spectra calculated using the projector augmented-wave method. For the as-doped sample, the vacancy-rich region was found to be localized at a depth of 0–10 nm, and the major defect species were determined to be divacancy–B complexes. After spike rapid thermal annealing at 1075 °C, the lineshape parameter $S$ of Doppler broadening spectra corresponding to the high-B-concentration region (4–30 nm) was found to be smaller than the characteristic $S$ value obtained for defect-free Si. From a detailed analysis of the Doppler broadening spectra, the origin of the decrease in the $S$ value was attributed to the trapping of positrons by negatively charged B clusters such as icosahedral B12.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2010-05-25
著者
-
Ishibashi Shoji
Research Institute For Computational Sciences (rics) National Institute Of Advanced Industrial Scien
-
Tsutsui Kazuo
Interdisciplinary Graduate School Of Science & Engineering Tokyo Institute Of Technology
-
Uedono Akira
Institute of Applied Physics and Graduate School of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba 305-8573, Japan
-
Akira Uedono
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
-
Hiroshi Iwai
Frontier Research Center, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
-
Hiroshi Iwai
Frontier Research Center, Tokyo Institute of Technology, Yokohama 226-8502, Japan
-
Hiromichi Watanabe
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
-
Shoji Kubota
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
-
Yasumasa Nakagawa
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, Yokohama 226-8502, Japan
-
Bunji Mizuno
Ultimate Junction Technologies Inc., Moriguchi, Osaka 570-8501, Japan
-
Takeo Hattori
Frontier Research Center, Tokyo Institute of Technology, Yokohama 226-8502, Japan
-
Shoji Ishibashi
Research Institute for Computational Sciences, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
-
Kazuo Tsutsui
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, Yokohama 226-8502, Japan
関連論文
- Characterization of Diamond Films Synthesized on Si from a Gas Phase in Microwave Plasma by Slow Positrons
- Defect Production in Phosphorus Ion-Implanted SiO_2(43 nm)/Si Studied by a Variable-Energy Positron Beam
- Vacancy-Type Defects in As^+-Implanted SiO_2(43 nm)/Si Proved with Slow Positrons
- Investigation of Positron Moderator Materials for Electron-Linac-Based Slow Positron Beamlines
- Positron Annihilation in Proton Irradiated Czochralski-Grown Si
- Analysis of Screening Mechanisms for Polar Discontinuity for LaAlO_3/SrTiO_3 Thin Films Based on Ab initio Calculations(Condensed matter: electronic structure and electrical, magnetic, and optical properties)
- Characterization of Separation-by-Implanted-Oxygen Wafers with Monoenergetic Positron Beams
- Evaluation of Variable Energy Level of Conduction Band Edge on Fluoride Resonant Tunneling Diodes
- Characterizing Metal-Oxide Semiconductor Structures Consisting of HfSiO_x as Gate Dielectrics using Monoenergetic Positron Beams
- Defects Introduced by MeV-Energy Ion Implantation into Si Probed by a Monoenergetic Positron Beam
- Single-Component Molecular Metals as Multiband π-d Systems(Condensed matter: electronic structure and electrical, magnetic, and optical properties)
- Effects of the Fermi Level on Defects in Be^+-Implanted GaAs Studied by a Monoenergetic Positron Beam
- Electronic Structures of Single Component Molecular Metals Based on Ab initio Calculation(Condensed matter: electronic structure and electric, magnetic, and optical properties)
- Ab Initio Electronic Structure Calculation for Single-Component Molecular Conductor Au(tmdt)_2 (tmdt=Trimethylenetetrathiafulvalenedithiolate)(Condensed Matter : Electronic Structure, Electrical, Magnetic and Optical Properties)
- Annealing Properties of Defects in Ion-Implanted 3C-SiC Studied Using Monoenergetic Positron Beams
- Defects in Ion-Implanted 3C-SiC Probed by a Monoenergetic Positron Beam
- Oxygen Microclusters in Czochralski-Grown Si Probed by Positron Annihilation
- Local Bonding Structure of High-Stress Silicon Nitride Film modified by UV Curing for Strained-Silicon Technology beyond 45nm Node SoC Devices
- Defects in Ion Implanted Hg_Cd_Te Probed by Monoenergetic Positron Beams
- Defects and Their Annealing Properties in B^+-Implanted Hg_Cd_Te Studied by Positron Annihilation
- A Study of Native Defects in Ag-doped HgCdTe by Positron Annihilation
- Reversible Photodissociation of Hexacarbonyl Tungsten in Cross-Linked Polymers
- Annealing Properties of Defects in B^+- and F^+-Implanted Si Studied Using Monoenergetic Positron Beams
- Fluorine-Related Defects in BF^+_2-Implanted Si Probed by Monoenergetic Positron Beams
- Effects of Recoil-Implanted Oxygen on Depth Profiles of Defects and Annealing Processes in P^+-Implanted Si Studied Using Monoenergetic Positron Beams
- Formation of Oxygen-Related Defects Enhanced by Fluorine in BF^+_2-Implanted Si Studied by a Monoenergetic Positron Beam
- Characterization of Metal/GaAs Interfaces by Monoenergetic Positron Beam
- Oxygen-Related Defects Introduced by As^+-Implantation through Cap Layers in Si Probed by Monoenergetic Positron Beams
- Investigation of Vacancy-Type Defects in P^+-Implanted 6H-SiC Using Monoenergetic Positron Beams
- Defects in TiN Films Probed by Monoenergetic Positron Beams
- Vacancy-Type Defects in Ion-Implanted Diamonds Probed by Monoenergetic Positron Beams
- Defects in Heavily Phosphorus-Doped Si Epitaxial Films Probed by Monoenergetic Positron Beams
- Single-Electron Devices Formed by Self-Ordering Metal Nanodroplet Arrays on Epitaxial CaF_2 Film
- Multitunneling Junction of Metal Droplets Formed on CaF_2 Step Edges in a Self-Assembling Manner
- Multi-Tunnelling Junctions of Metal Droplets Formed on CaF2 Stepedges by Self-Assembling Manner
- Artificial Control of Dot Sites for Ga Droplet Arrays on CaF_2 Films by Surface Steps and Electron Beam Modifications ( Quantum Dot Structures)
- Site Control of Ga Droplet Array on CaF_2 by Surface Modification Using a Focused Electron Beam
- Site Control of Metal Droplet Formation on CaF_2 Surface Using a Focused Electron Beam
- Thermal Equilibrium Defects in Anthracene Probed by Positron Annihilation
- Defects in Czochralski-Grown Silicon Crystals Investigated by Positron Annihilation
- Defects Introduced by Ar Plasma Exposure in GaAs Probed by Monoenergetic Positron Beam
- Space-Charge-Limited Currents in La_2O_3 Thin Films Deposited by E-Beam Evaporation after Low Temperature Dry-Nitrogen Annealing
- Compatibilization of Metallocene Polyethylene/Polyamide Blends with Maleic Anhydride Studied by Positron Annihilation
- Vacancy-Type Defects in Be-Implanted InP
- Free Volume in Polycarbonate Studied by Positron Annihilation : Effects of Free Radicals and Trapped Electrons on Positronium Formation : Structure and Mechanical and Thermal Properties of Condensed Matter
- Evaluation of SOI Substrates by Positron Annihilation
- A Possible Ground State and Its Electronic Structure of a Mother Material (LaOFeAs) of New Superconductors(Condensed matter : electronics structure and electrical, magnetic, and optical properties)
- Effects of Post Dielectric Deposition and Post Metallization Annealing Processes on Metal/Dy_2O_3/Si(100) Diode Characteristics
- Oxygen Clusters in Quenched Czochralski-Si Studied by Infrared Spectroscopy and Positron Annihilation
- Reactive Ion Etched II-VI Quantum Dots: Dependence of Etched Profile on Pattern Geometry
- Structure-modification model of porogen-based porous SiOC film with ultraviolet curing (Special issue: Advanced metallization for ULSI applications)
- Defects Induced by Wafer Processing and Thermal Treatment in InP Probed with Monoenergetic Positrons
- Positron Study of Vacancy-Type Defects Induced by Heavy Doping into MBE-Grown GaAs
- Homoepitaxial Growth of SrTiO_3 in an Ultrahigh Vacuum with Automatic Feeding of Oxygen from the Substrate at Temperatures as Low as 370℃ : Surfaces, Interfaces, and Films
- First-Principles Study of the Stability and Interfacial Bonding of Tilt and Twist Grain Boundaries in Al and Cu
- Defects in SiO_2 /Si Structures Probed by Using a Monoenergetic Positron Beam
- Heteroepitaxial Growth of CdF_2 Layers on CaF_2/Si(111) by Molecular Beam Epitaxy
- CdF_2/CaF_2 Resonant Tunneling Diode Fabricated on Si(111)
- CdF_2/CaF_2 Resonant Tunneling Diode Fabricated on Si(111)
- Electrical Characterization of La2O3-Gated Metal Oxide Semiconductor Field Effect Transistor with Mg Incorporation
- First-Principles Electronic-Structure Study for TTF-TCNQ under Hydrostatic Pressure
- Rare earth oxide capping effect on La2O3 gate dielectrics for equivalent oxide thickness scaling toward 0.5nm (Special issue: Dielectric thin films for future electron devices: science and technology)
- Slow Positron Beam Apparatus for Surface and Subsurface Analysis of Samples in Air
- First-Principles Calculations of Schottky Barrier Heights of Monolayer Metal/6H-SiC{0001} Interfaces
- Ab Initio Electronic-Structure Calculations for α-(BEDT-TTF)_2I_3
- Optical In Situ Observation of Electron Beam Induced Surface Modification of Epitaxial Fluoride Films
- Silicate reaction control at lanthanum oxide and silicon interface for equivalent oxide thickness of 0.5nm: adjustment of amount of residual oxygen atoms in metal layer (Special issue: Dielectric thin films for future electron devices: science and technol
- Fluoride Resonant Tunneling Diodes Co-integrated with Si-MOSFETs
- Epitaxial Growth of Ca_xCd_F_2 Mixed Crystal Films on Si Substrates
- Effects of the Two-Step Growth Method for GaAs Grown on CaF_2/Si(111) with the Electron Beam Surface Modification Technique
- Selective Growth of Wire Structures of GaAs on CaF_2 Usimg Focused Electron Beams
- Fabrication of Fluoride Resonant Tunneling Diodes on V-grooved Si(100) Substrates
- Fluoride Resonant Tunneling Diodes on Si Substrates Improved by the Additional Thermal Oxidation Process
- Characterization of Hf0.3Al0.7Ox Fabricated by Atomic-Layer-Deposition Technique Using Monoenergetic Positron Beams
- Erratum: “Analysis of Screening Mechanisms for Polar Discontinuity for LaAlO3/SrTiO3 Thin Films Based on Ab initio Calculations”
- Reduced Defect Densities in Cubic GaN Epilayers with AlGaN/GaN Superlattice Underlayers Grown on (001) GaAs Substrates by Metalorganic Vapor Phase Epitaxy
- Variation of Chemical Vapor Deposited SiO Density Due to Generation and Shrinkage of Open Space During Thermal Annealing
- First-Principles Electronic-Structure Study for Organic Ferroelectric Tetrathiafulvalene–$ p$-Bromanil
- Study of Interactions of Hf and SiO2 Film for High-$k$ Materials
- Doping Effects from Neutral B2H6 Gas Phase on Plasma Pretreated Si Substrates as a Possible Process in Plasma Doping
- Capacitance--Voltage Characterization of La2O3 Metal--Oxide--Semiconductor Structures on In0.53Ga0.47As Substrate with Different Surface Treatment Methods
- Local Bonding Structure of High-Stress Silicon Nitride Film Modified by UV Curing for Strained Silicon Technology beyond 45 nm Node SoC Devices
- Heteroepitaxy of Cd-Rich CaxCd1-xF2 Alloy on Si Substrates and Its Application to Resonant Tunneling Diodes
- Impact of Residual Impurities on Annealing Properties of Vacancies in Electroplated Cu Studied Using Monoenergetic Positron Beams
- Positron Annihilation Study on Defects in HfSiON Films Deposited by Electron-Beam Evaporation
- Effect of Post-Metallization Annealing on Electrical Characteristics of La2O3 Gate Thin Films
- First-Principles Electronic Structure of Solid Picene
- Characteristics of Ultrathin Lanthanum Oxide Films on Germanium Substrate: Comparison with Those on Silicon Substrate
- Vacancy-Boron Complexes in Plasma Immersion Ion-Implanted Si Probed by a Monoenergetic Positron Beam
- Characterization of Low-$k$/Cu Damascene Structures Using Monoenergetic Positron Beams
- Positron Annihilation in Germanium in Thermal Equilibrium at High Temperature
- Influence of Structural Parameters on Electrical Characteristics of Schottky Tunneling Field-Effect Transistor and Its Scalability
- Defects in Electroplated Cu and Their Impact on Stress Migration Reliability Studied using Monoenergetic Positron Beams
- Fluoride Resonant Tunneling Diodes on Si Substrates Improved by Additional Thermal Oxidation Process
- Fabrication of Fluoride Resonant Tunneling Diodes on V-Grooved Si(100) Substrates
- Fluorine-Related Defects in BF2+-Implanted Si Probed by Monoenergetic Positron Beams
- Influence of Structural Parameters on Electrical Characteristics of Schottky Tunneling Field-Effect Transistor and Its Scalability (Special Issue : Solid State Devices and Materials)
- Erratum: "Ab Initio Electronic Structure Calculation for Single-Component Molecular Conductor Au(tmdt)2 (tmdt = Trimethylenetetrathiafulvalenedithiolate)"
- Thermal Equilibrium Defects in Anthracene Probed by Positron Annihilation
- Ab Initio Electronic Structure Calculation for Single-Component Molecular Conductor Au(tmdt)_2 (tmdt=Trimethylenetetrathiafulvalenedithiolate)(Condensed Matter : Electronic Structure, Electrical, Magnetic and Optical Properties)