Local Bonding Structure of High-Stress Silicon Nitride Film Modified by UV Curing for Strained Silicon Technology beyond 45 nm Node SoC Devices
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概要
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Silicon nitride films (p-SiN) with different high stresses were formed by changing the monosilane-to-ammonia source gas ratio, RF power, and deposition temperature in a conventional plasma-enhanced chemical vapor deposition (PECVD). PECVD was used to deposit p-SiN films with high-stresses because it can flexibly change the stress of the film to be formed from tensile to compressive direction. The formed films were analyzed by Fourier transform-infrared spectroscopy (FT-IR), X-ray photoelectron spectroscopy (XPS), nanoindentation, and positron-beam annihilation to obtain data on local bonding structure, mechanical properties and the behavior of vacancies in the p-SiN films. In this study, to clarify the local bonding structure of high stress SiN films, we investigated p-SiN films with and without ultraviolet (UV) curing that is effective in tensile stress. It has been confirmed that total hydrogen ($\text{Si--H}+\text{N--H}$) concentration decreases with increasing film stress of p-SiN films. It has been found that UV curing promotes Si–N–Si crosslinking due to dehydrogenization, leading to the formation of a stoichiometric silicon nitride, Si3N4, network structure, and the vacancies in the p-SiN films shrink during UV curing. Finally, we proposed a structural model for the local bonding arrangement in p-SiN films with UV curing.
- 2007-04-30
著者
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Hattori Nobuyoshi
Process Technology Development Division Renesas Technology Corp.
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Asai Koyu
Process Development Department Process Technology Development Division Production And Technology Uni
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Nakai Takehiro
Process Technology Development Division Renesas Technology Corp.
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Nishida Yukio
Process Technology Development Div. Renesas Technology Corp.
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Murata Tatsunori
Process Technology Development Division Renesas Technology Corp.
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Matsuura Masazumi
Process Technology Development Division Renesas Technology Corp.
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Miyagawa Yoshihiro
Process Technology Development Div. Renesas Technology Corp.
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Yoneda Masahiro
Process Development Dept. Process Technology Development Div. Production And Technology Unit Renesas
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Asai Koyu
Process Technology Development Division, Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Uedono Akira
Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573, Japan
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Uedono Akira
Institute of Applied Physics and Graduate School of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba 305-8573, Japan
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Murata Tatsunori
Process Technology Development Division, Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Matsuura Masazumi
Process Technology Development Division, Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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YONEDA Masahiro
Process Development Department, Process Technology Development Division, Production and Technology Unit, Renesas Technology Corporation
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Miyagawa Yoshihiro
Process Technology Development Division, Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Hattori Nobuyoshi
Process Technology Development Division, Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Nishida Yukio
Process Technology Development Division, Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Yoneda Masahiro
Process Development Department, Process Technology Development Division, Production and Technology Unit, Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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Yoneda Masahiro
Process Technology Development Division, Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
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