Variation of Chemical Vapor Deposited SiO Density Due to Generation and Shrinkage of Open Space During Thermal Annealing
スポンサーリンク
概要
著者
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Hasunuma Ryu
Institute Of Applied Physics University Of Tsukuba
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Yamabe Kikuo
Institute Of Applied Physics University Of Tsukuba
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Uedono Akira
Institute of Applied Physics and Graduate School of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba 305-8573, Japan
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Sometani Mitsuru
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
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Ogino Masaaki
Electronic Device Laboratory, Fuji Electric Co., Ltd.
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Kuribayashi Hitoshi
Matsumoto Factory, Electronic Devices Business Headquater, Fuji Electric Co., Ltd., Matsumoto, Nagano 390-0821, Japan
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Sugahara Yoshiyuki
Matsumoto Factory, Electronic Devices Business Headquater, Fuji Electric Co., Ltd., Matsumoto, Nagano 390-0821, Japan
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