Structure-modification model of porogen-based porous SiOC film with ultraviolet curing (Special issue: Advanced metallization for ULSI applications)
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
著者
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Uedono Akira
Institute of Applied Physics and Graduate School of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba 305-8573, Japan
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Oka Yoshihiro
Thinfilm and Wet/Diffusion Engineering Department, Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
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Goto Kinya
Thinfilm and Wet/Diffusion Engineering Department, Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
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Hirose Yukinori
Analysis and Evaluation Technology Department, Renesas Electronics Corporation, Itami, Hyogo 664-0005, Japan
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Matsuura Masazumi
Thinfilm and Wet/Diffusion Engineering Department, Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
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Fujisawa Masahiko
Thinfilm and Wet/Diffusion Engineering Department, Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
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Asai Koyu
Thinfilm and Wet/Diffusion Engineering Department, Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
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