Electron Beam Mask Fabrication for MOSLSI's with 1.5 μm Design Rule : A-1: ADVANCED LITHOGRAPHY AND PROCESS
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1980-04-30
著者
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Takeda Eiji
Central Research Laboratory Hitachi Ltd.
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Takeda Eiji
Central Research Laboratory Hitachi Lid.
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MOCHIJI Kozo
Central Research Laboratory, Hitachi Ltd.
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OKAZAKI Shinji
Central Research Laboratory, Hitacti, Ltd.
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Mochiji Kozo
Central Research Laboratory Hitachi Ltd.
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Okazaki Shinji
Central Research Lab. Hitachi Ltd.
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MARUYAMA YOji
Central Research Laboratory, Hitachi Ltd.
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Maruyama Yoji
Central Research Laboratory Hitachi Ltd.
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Takeda Eiji
Central Research Laboratory
関連論文
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- Effect of Dietary Phosphate on Na^+-Dependent Phosphate Cotransporters Function and Expression in the Rat Kidney
- Dietary regulation of renal phosphate transporters in hypophosphatemic mice
- Acute Regulation by Dietary Phosphate of the Sodium-Dependent Phosphate Transporter (NaP_i-2) in Rat Kidney^1
- Influence of Oxygen upon Radiation Durability of SiN X-Ray Mask Membranes : Lithography Technology
- Influence of Oxygen upon Radiation Durability of SiN X-ray Mask Membranes
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- Control of oxidative stress and metabolic homeostasis by the suppression of postprandial hyperglycemia
- Polymorphism in the caudal-related homeodomain protein Cdx-2 binding element in the human vitamin D receptor
- Phosphorus Supply per Capita from Food in Japan between 1960 and 1995
- Direct demonstration of humorally mediated inhibition of the transcription of phosphate transporter in XLH patients
- X-Ray Mask Technology Utilizing an Optical Stepper
- Thermal and Ion-Induced Reactions on a Chlorine-Adsorbed GaAs (100) Surface Studied by Metastable-Atom De-excitation Electron Spectroscopy
- Surface Reaction Induced by Multiply-Charged Ions
- Photon-Stimulated Ion Desorption from Semiconductor Surfaces
- Negative Tone Dry Development of Si-Containing Resists by Laser Ablation
- New Dry Surface-Imaging Process for X-Ray Lithography
- Simulation of AZ-PN100 Resist Pattern Fluctuation in X-Ray Lithography, Including Synchrotron Beam Polarization
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- Correlation of Nano Edge Roughness in Resist Patterns with Base Polymers
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- A Novel Probe Size Measurement Method for a Fine Electron Beam : Inspection and Testing
- Effect of EB Acceleration Voltage and Beam Sharpness on Process Latitude of 0.2 μm Lines
- Resolution Limitation of Proximity X-Ray Lithography Determined by Waveguide Effect
- New Observation of Hot-Carrier Injection Phenomena : A-3: LSI-2
- Total parenteral nutrition on energy metabolism in children undergoing autologous periphral blood stem cell transplantation
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- Analysis of Chemical Amplification Resist Systems Using a Kinetic Model and Numerical Simulation : Resist Material and Process
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- Evaluation of Pupil-Filtering in High-Numerical Aperture I-Line Lens
- Anomalous Conductance of Si-MOSFET Quantum Wires : From Quantum Wire to Quantum Dotted Line
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- The Effects of Secondary Electrons form a Silion Substrate on SR X-Ray Lithography : Lithography Technology
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