Low-Voltage High-Gain 0.2 μm N-Channel Metal Oxide Semiconductor Field Effect Transistors by Channel Counter Doping with Arsenic
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-01-30
著者
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Takeda Eiji
Central Research Laboratory Hitachi Ltd.
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Takeda Eiji
Central Research Laboratory Hitachi Lid.
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UMEDA Kazunori
Central Research Laboratory, Hitachi, Ltd.
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Nagai R
Free-electron Laser Laboratory Advanced Photon Research Center Japan Atomic Energy Research Institut
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Umeda K
Department Of Electronic Science And Engineering Kyoto University
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NAGAI Ryuta
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)
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Umeda Kazunori
Central Research Laboratory Hitachi Ltd.
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NAGAI Ryo
Central Research Laboratory, Hitachi Ltd.,
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Nagai Ryo
Central Research Laboratory Hitachi Ltd.
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Takeda Eiji
Central Research Laboratory
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