Dark-Field Phase Shifter Edge Mask for Actual Logic Gate Patterns
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-06-15
著者
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Fukumoto Keiko
Device Development Center Hitachi Ltd.
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Okamoto Yoshihiko
Semiconductor Technology Development Division Hitachi Ltd.
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Okamoto Yoshihiko
Semiconductor Device Engineering Department Tokyo Shibaura Electric Co. Ltd.
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Fukuda Hiroshi
Central Research Laboratory Hitachi Ltd.
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Fukuda Hiroshi
Central Research Labolatory Hitachi Ltd.
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Hotta Shoji
Device Development Center Hitachi Ltd.
関連論文
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- Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks
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- Impact of Long-Period Line-Edge Roughness (LER) on Accuracy in Critical Dimension (CD) Measurement and New Guideline for CD Metrology
- A Detection Method for a T-Topped Profile in Resist Patterns by Top-Down-View Critical Dimension Scanning Electron Microscope
- A New Instability in MOS Transistor Caused by Hot Electron and Hole Injection from Drain Avalanche Plasma into Gate Oxide
- Prospects for Optical-, EB-, and X-Ray Lithography for Giga-Bit Memory : Advantages and Disadvantages
- Dark-Field Phase Shifter Edge Mask for Actual Logic Gate Patterns
- Direct Patterning of Spin-on-Glass Materials by ArF Excimer Laser Irradiation and Their New Application to Hard-mask Processes
- Novel Process for Direct Delineation of Spin on Glass (SOG) : Resist Material and Process
- A New Pupil Filter for Annular Illumination in Optical Lithography
- Axial Image Superposing (Super-FLEX) Effect Using the Mask Modulation Method for Optical Lithography
- Analysis of Chemical Amplification Resist Systems Using a Kinetic Model and Numerical Simulation : Resist Material and Process
- Phase Retrieval from Defocused Images and Its Applications in Lithography
- Evaluation of Pupil-Filtering in High-Numerical Aperture I-Line Lens
- Impact of Long-Period Line-Edge Roughness (LER) on Accuracy in Critical Dimension (CD) Measurement and New Guideline for CD Metrology
- A Detection Method for a T-Topped Profile in Resist Patterns by Top-Down-View Critical Dimension Scanning Electron Microscope
- Primting Isolated Features with k_1 = 0.2 Using Multiple-Pupil Exposure
- Axial Image Superposing (Super-FLEX) Effect Using the Mask Modulation Method for Optical Lithography : Photolithography