Okamoto Yoshihiko | Semiconductor Technology Development Division Hitachi Ltd.
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概要
関連著者
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Okamoto Yoshihiko
Semiconductor Technology Development Division Hitachi Ltd.
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Okamoto Yoshihiko
Semiconductor Device Engineering Department Tokyo Shibaura Electric Co. Ltd.
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Fukumoto Keiko
Device Development Center Hitachi Ltd.
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Fukuda Hiroshi
Central Research Laboratory Hitachi Ltd.
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Fukuda Hiroshi
Central Research Labolatory Hitachi Ltd.
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Hotta Shoji
Device Development Center Hitachi Ltd.
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HARA Hisashi
Toshiba Research and Development Center, Tokyo Shibaura Electric Co., Ltd.
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OHNUMA Hiroie
Semiconductor Device Engineering Department, Tokyo Shibaura Electric Co., Ltd.
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Hara Hisashi
Toshiba Research And Development Center Tokyo Shibaura Electric Co. Ltd.
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Hara Hisashi
Toshiba Corporation
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Ohnuma Hiroie
Semiconductor Device Engineering Department Tokyo Shibaura Electric Co. Ltd.
著作論文
- A New Instability in MOS Transistor Caused by Hot Electron and Hole Injection from Drain Avalanche Plasma into Gate Oxide
- Dark-Field Phase Shifter Edge Mask for Actual Logic Gate Patterns