Hara Hisashi | Toshiba Corporation
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概要
関連著者
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Hara Hisashi
Toshiba Corporation
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Okamoto Yoshihiko
Semiconductor Technology Development Division Hitachi Ltd.
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Okamoto Yoshihiko
Semiconductor Device Engineering Department Tokyo Shibaura Electric Co. Ltd.
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HARA Hisashi
Toshiba Research and Development Center, Tokyo Shibaura Electric Co., Ltd.
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OHNUMA Hiroie
Semiconductor Device Engineering Department, Tokyo Shibaura Electric Co., Ltd.
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Hara Hisashi
Toshiba Research And Development Center
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Hara Hisashi
Toshiba Research And Development Center Tokyo Shibaura Electric Co. Ltd.
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Ohnuma Hiroie
Semiconductor Device Engineering Department Tokyo Shibaura Electric Co. Ltd.
著作論文
- A New Instability in MOS Transistor Caused by Hot Electron and Hole Injection from Drain Avalanche Plasma into Gate Oxide
- Note on Limitations in MOS LSI's from a Design Viewpoint : E-2: PHYSICAL AND TECHNOLOGICAL LIMITS OF HIGH-DENSITY INTERGRATION
- Special Issue on SOI Devices and Their Process Technologies