Gas Mixing Effect on Ion Current Spectrum and Its Application to Optimize Implantation Source Gas Composition

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概要

• 論文の詳細を見る

• In a Penning discharge ion source, He (small atomic number) and Ar (large atomic number) gases are shown to play the roles of diluent and excimer, respectively, when mixed with O_2. The gas composition is optimized at Ar(0.1%)-He(90%)-O_2(10%), producing a high O^+ ion current as well as good operation and maintenance of the implanter. In both N_2-O_2 gas mixture and N_xO_y compound gas, the O^+ ion current is almost proportional to the oxygen content. A high NO^+ molecular current is obtained with NO compound gas, rather than with N_2(50%)-O_2(50%) gas mixture. The present results are a valuable guide to the selection of other gas mixtures for implantation.

• 社団法人応用物理学会の論文
• 1982-04-20

著者

• KAJIYAMA Kenji

  Electrical Communication Laboratories

• Kajiyama Kenji

  Electrical Communication Laboratories Ntt

• IRITA Yukio

  Electrical Communication Laboratories, NTT

• Irita Yukio

  Electrical Communication Laboratories Ntt

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