Shingubara Shoso | Department Of Applied Physics Tokyo Institute Of Technology:vlsi Research Center Toshiba Corporation

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著作論文

Measurement of Fluorocarbon Radicals Generated from C_4F_8/H_2 Inductively Coupled Plasma : Study on SiO_2 Selective Etching Kinetics
Well-size-controlled Golloidal Gold nanoparticles Dispersed in Organic Solvents
Self-Organized Gold Nanodots Array on a Silicon Substrate and Its Mechanical Stability
Control of Interdot Space and Dot Size in a Two-Dimensional Gold Nanodot Array
Self-Organization of a Two-Dimensional Array of Gold Nanodots Encapsulated by Alkanethiol
Ordered Two-Dimensional Nanowire Array Formation Using Self-Organized Nanoholes of Anodically Oxidized Aluminum
Highly Selective SiO_2 Etching Using CF_4/C_2H_4
Gap-filling of Cu Employing Sustained Self-Sputtering with Inductively Coupled Plasma Ionization
Scanning Tunneling Microscopy Observation on the Atomic Structures of Step Edges and Etch Pits on a NH_4F-Treated Si(111) Surface
Gap-Filling of Cu Employing Self-Sustained Sputtering with ICP Ionization
Vortices around a Sinkhole: Phase Diagram for One-Celled and Two-Celled Vortices
Large magnetoresistance switching phenomena in nanoconduction path formed with dielectric breakdown of SiO2 multilayered with ferromagnetic film (Special issue: Microprocesses and nanotechnology)
High-Rate Bias Sputtering Filling of SiO2 Film Employing Both Continuous Wave and Time-Modulated Inductively Coupled Plasmas
Study on Adsorption Behavior of Organic Contaminations on Silicon Surface by Gas Chromatography/Mass Spectrometry
Electromigration Characteristics of Cu-Al Precipitate in AlCu Interconnection
Sputtering of Aluminum Film Using Microwave Plasma with High Magnetic Field
Formation of Vortices around a Sinkhole
A Model for Resolution Dependent Roughness Values Measured by an Optical Profiler for Specific Surfaces

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