Fujimura Shuzo | Process Development Division Fujitsu Ltd.
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概要
関連著者
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FUJIMURA Shuzo
Process Development Division, Fujitsu Ltd.
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Fujimura Shuzo
Precess Development Division C850 Fujitsu Limited
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Fujimura Shuzo
Process Development Division Fujitsu Ltd.
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Fujimura Shuzo
Process Development Div. C850 Fujitsu Ltd.
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Ogawa Hiroki
Precess Development Division C850 Fujitsu Limited
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Kikuchi J
Axiomatic Inc. Tokyo Jpn
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OGAWA Hiroki
Advic Inc.
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Ogawa H
Advic Inc.
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OGAWA Hiroki
Process development Division C850 FUJITSU LIMITED
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Suzuki Miki
Precess Development Division C850 Fujitsu Limited
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KIKUCHI Jun
Manufacturing Technology Division, Fujitsu Ltd.
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YANO Hiroshi
Manufacturing Technology Division, Fujitsu Ltd.
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Kikuchi Jun
Manufacturing Technology Division Fujitsu Ltd.
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HAYAMI Yuka
Process development Division C850 FUJITSU LIMITED
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Hayami Yuka
Precess Development Division C850 Fujitsu Limited
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Yano H
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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石川 賢司
四日市大学総合政策学部
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Fukata N
Univ. Tsukuba Tsukuba Jpn
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Fukata Naoki
Institute For Materials Research Tohoku University
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Murakami K
静岡大学電子工学研究所
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Sasaki S
Institute Of Materials Science University Of Tsukuba
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MURAKAMI Kouichi
Institute of Materials Science, University of Tsukuba, Tsukuba Academic City
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Murakami Kouichi
Institute Of Materials Science University Of Tsukuba
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Murakami Kouichi
Institute Of Material Science University Of Tsukuba
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Murakami Kouichi
Institute Of Applied Physics University Of Tsukuba
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Sasaki S
Ntt System Electronics Lab. Kanagawa Jpn
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ISHIKAWA Kenji
Process development division C850, Fujitsu Limited
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Okui Yoshiko
Precess Development Division C850 Fujitsu Limited
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Murakami K
Research Institute Of Electronics Shizuoka University
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Hosono H
Materials And Structures Laboratory Tokyo Institute Of Technology
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HORIIKE Yasuhiro
Department of Electrical Engineering, Toyo University
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Kanai M
Inst. Physical And Chemical Res. (riken) Saitama Jpn
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Kawai M
Riken (inst. Physical And Chemical Res.) Saitama Jpn
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FUJIMURA Shuzo
Basic Process Development Div.
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Kawai Masayuki
Faculty Of Science Tokai University
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HANEDA Hajime
National Institute for Materials Science
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NAGASAKA Mitsuaki
Manufacturing Technology Division, Fujitsu Ltd.
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Nagasaka Mitsuaki
Manufacturing Technology Division Fujitsu Ltd.
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Horiike Yasuhiro
National Institute For Materials Science
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Horiike Yasuhiro
Department Of Electrical & Electronics Engineering Tokyo University
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Horiike Yasuhiro
Faculty Of Engineering Hiroshima University
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Horiike Yasuhiro
Department Of Electrical Engineering Toyo University
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KITAJIMA Masahiro
National Research Institute for Metals
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ISHIOKA Kunie
National Research Institute for Metals
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Sasaki Shinichi
Institute Of Materials Science University Of Tsukuba
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KIKUCHI Jun
Process Development Division, Fujitsu Ltd.
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OKUI Yoshiko
Process development Division C850 FUJITSU LIMITED
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SUZUKI Miki
Process Development Division, C850, FUJITSU LIMITED
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Kikuchi Jun
Process Development Division Fujitsu Ltd.
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堀池 靖浩
広島大工
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Kawai M
Institute Of Molecular And Cellular Biosciences University Of Tokyo
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Ishioka Kunie
National Institute For Materials Sciences Japan.
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Haneda H
Sensor Materials Center National Inst. For Materials Sci.
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Haneda Hajime
National Institute For Material Science
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Izumi K
National Institute For Materials Science
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Ishioka K
National Res. Inst. Metals Tsukuba Jpn
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Kinugasa Masanori
Research An Development Tayca Co. Ltd.
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Kitajima Masahiro
National Institute For Materials Sciences Japan.
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Ishioka Kunie
National Institute for Materials Science
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Kitajima Masahiro
National Defense Academy of Japan, Yokosuka, Kanagawa 239-8686, Japan
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Suzuki Miki
Process development Division C850 FUJITSU LIMITED
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堀池 靖浩
物質･材料研究機構
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UENO Nobuo
Department of Materials Technology, Faculty of Engineering, Chiba University
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Ueno Nobuo
Department Of Applied Physics Tohoku University
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Ueno Nobuo
Department Of Materials Science Faculty Of Engineering Chiba University
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Aoki M
Hitachi Ltd. Tokyo Jpn
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Aoki Masaru
Department Of Chemistry Graduate School Of Arts And Sciences The University Of Tokyo
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Aoki M
Univ. Tokyo Tokyo Jpn
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HORIIKE Yasuhiro
Electrical & Electronics Engineering, Toyo University
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IGA Masao
Manufacturing Technology Division, FUJITSU LIMITED
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OGAWA Hiroki
Basic Process Development Division, FUJITSU LIMITED
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SUZUKI Masafumi
Manufacturing Technology Division, Fujitsu Ltd.
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Iga Masao
Manufacturing Technology Division Fujitsu Limited
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Horiike Yasuhiro
Faculty Of Engineering Toyo University
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Horiike Yasuhiro
National Inst. For Materials Sci. Ibaraki Jpn
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Horiike Yasuhiro
Research Center For Integrated Systems Hiroshima University:(present Address)department Of Electrica
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Horiike Yasuhiro
Biomaterials Center National Institute For Materials Science
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Harada Y
Univ. Tokyo Tokyo Jpn
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Harada Yoshinao
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Harada Yoshinao
Ulsi Process Technology Development Center Matsushita Electronics Corp.
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NAKAMURA Kazutaka
National Research Institute for Metals
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HARADA Yoshiya
Department of Materials Science, Faculty of Engineering, Chiba University
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Aoki Masaru
Advanced Display Incorporated
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SASAKI Shin-ichi
Institute of Materials Science, University of Tsukuba
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SUZUKI Miki.
Process development Division C850 FUJITSU LIMITED
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HAYAMI Yuka
Precess Development Division C850, FUJITSU LIMITED
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OKUI Yoshiko
Precess Development Division C850, FUJITSU LIMITED
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OSHIDA Sumiko
Process development division C850, Fujitsu Limited
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SUZUKI Kaina
Process development division C850, Fujitsu Limited
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Aoki M
Ion Engineering Res. Inst. Corp. Osaka Jpn
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Suzuki Kaina
Process Development Division C850 Fujitsu Limited
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Harada Y
Life Culture Department Seitoku University
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Oshida Sumiko
Process Development Division C850 Fujitsu Limited
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Harada Yoshiya
Department Of Chemistry College Of Arts And Sciences The University Of Tokyo
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Nakamura Kazutaka
National Research Institute Of Metals
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Ogawa Hiroki
Basic Process Development Division Fujitsu Limited
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Suzuki Masafumi
Manufacturing Technology Division Fujitsu Ltd.
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Horiike Yasuhiro
Development Of Material Science School Of Engineering University Of Tokyo
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Horiike Yasuhiro
World Premier International (wpi) Research Center Initiative International Center For Materials Nano
著作論文
- Cleaning of Silicon Surfaces by NF_3-Added Hydrogen and Water-Vapor Plasma Downstream Treatment
- Cleaning of Silicon Surfaces by NF_3 Added Hydrogen and Water Vapor Plasma Downstream Treatment
- Native Oxide Removal on Si Surfaces by NF_3-Added Hydrogen and Water Vapor Plasma Downstream Treatment
- Effects of H_2O on Atomic Hydrogen Generation in Hydrogen Plasma
- Hydrogen Molecules in Defective Silicon
- Formation of Hydrogen Molecules in n-Type Silicon
- Hydrogen Passivation of Donors and Hydrogen States in Heavily Doped n-Type Silicon
- New Cleaning Solution ; Mixture of HF/HCl and Pure Water Containing a Little Dissolved Oxygen
- Characterization of Cleaning Technology for Silicon Surfaces by Hot Pure Water Containing Little Dissolved Oxygen
- Thickness-Deconvolved Structural Properties of Thermally Grown Silicon Dioxide Film
- Characterization of a Cleaning Technology for Silicon Surface by Hot Pure Water Containing a Little Dissolved Oxygen
- In-Situ Observation of Oxygen Exposed Hydrogen Terminated Silicon Surfaces
- Effects of Dissolved Oxygen in HF Solutiom on Silicon Surface Morphology