Characterization of Cleaning Technology for Silicon Surfaces by Hot Pure Water Containing Little Dissolved Oxygen

スポンサーリンク

概要

著者

関連論文

Study on Elemental Technologies for Creation of Healthcare Chip Fabricated on Polyethylene Terephthalate Plate
Cleaning of Silicon Surfaces by NF_3-Added Hydrogen and Water-Vapor Plasma Downstream Treatment
Cleaning of Silicon Surfaces by NF_3 Added Hydrogen and Water Vapor Plasma Downstream Treatment
Native Oxide Removal on Si Surfaces by NF_3-Added Hydrogen and Water Vapor Plasma Downstream Treatment
Effects of H_2O on Atomic Hydrogen Generation in Hydrogen Plasma
Hydrogen Molecules in Defective Silicon
Formation of Hydrogen Molecules in n-Type Silicon
Hydrogen Passivation of Donors and Hydrogen States in Heavily Doped n-Type Silicon
New Cleaning Solution ; Mixture of HF/HCl and Pure Water Containing a Little Dissolved Oxygen
Characterization of Cleaning Technology for Silicon Surfaces by Hot Pure Water Containing Little Dissolved Oxygen
Thickness-Deconvolved Structural Properties of Thermally Grown Silicon Dioxide Film
Characterization of a Cleaning Technology for Silicon Surface by Hot Pure Water Containing a Little Dissolved Oxygen
In-Situ Observation of Oxygen Exposed Hydrogen Terminated Silicon Surfaces
Effects of Dissolved Oxygen in HF Solutiom on Silicon Surface Morphology
Initial Stage of SiO_2/Si Interface Formation on Si(111) Surface
Development of Clinical Chips for Home Medical Diagnostics

もっと見る

スポンサーリンク