Characterization of a Cleaning Technology for Silicon Surface by Hot Pure Water Containing a Little Dissolved Oxygen
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概要
- 論文の詳細を見る
- 1995-08-21
著者
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Suzuki Miki
Precess Development Division C850 Fujitsu Limited
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Ogawa Hiroki
Precess Development Division C850 Fujitsu Limited
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FUJIMURA Shuzo
Process Development Division, Fujitsu Ltd.
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Fujimura Shuzo
Precess Development Division C850 Fujitsu Limited
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Fujimura Shuzo
Process Development Division Fujitsu Ltd.
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Fujimura Shuzo
Process Development Div. C850 Fujitsu Ltd.
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HAYAMI Yuka
Process development Division C850 FUJITSU LIMITED
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OGAWA Hiroki
Process development Division C850 FUJITSU LIMITED
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OKUI Yoshiko
Process development Division C850 FUJITSU LIMITED
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SUZUKI Miki
Process Development Division, C850, FUJITSU LIMITED
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Hayami Yuka
Precess Development Division C850 Fujitsu Limited
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Okui Yoshiko
Precess Development Division C850 Fujitsu Limited
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OGAWA Hiroki
Advic Inc.
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Ogawa H
Advic Inc.
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Suzuki Miki
Process development Division C850 FUJITSU LIMITED
関連論文
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- Cleaning of Silicon Surfaces by NF_3-Added Hydrogen and Water-Vapor Plasma Downstream Treatment
- Cleaning of Silicon Surfaces by NF_3 Added Hydrogen and Water Vapor Plasma Downstream Treatment
- Native Oxide Removal on Si Surfaces by NF_3-Added Hydrogen and Water Vapor Plasma Downstream Treatment
- Effects of H_2O on Atomic Hydrogen Generation in Hydrogen Plasma
- Hydrogen Molecules in Defective Silicon
- Formation of Hydrogen Molecules in n-Type Silicon
- Hydrogen Passivation of Donors and Hydrogen States in Heavily Doped n-Type Silicon
- New Cleaning Solution ; Mixture of HF/HCl and Pure Water Containing a Little Dissolved Oxygen
- Characterization of Cleaning Technology for Silicon Surfaces by Hot Pure Water Containing Little Dissolved Oxygen
- Thickness-Deconvolved Structural Properties of Thermally Grown Silicon Dioxide Film
- Characterization of a Cleaning Technology for Silicon Surface by Hot Pure Water Containing a Little Dissolved Oxygen
- In-Situ Observation of Oxygen Exposed Hydrogen Terminated Silicon Surfaces
- Effects of Dissolved Oxygen in HF Solutiom on Silicon Surface Morphology
- Initial Stage of SiO_2/Si Interface Formation on Si(111) Surface
- Development of Clinical Chips for Home Medical Diagnostics