High-Rate and Smooth Surface Etching of Al_2O_3TiC Employing Inductively Coupled Plasma (ICP)

概要

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High-rate and smooth surface etching of Al_2O_3-TiC, which is widely used as a slider material for magnetic recording heads, has been developed employing inductively coupled plasma (ICP). The etching rate of 200 nm/min was obtained with Cl_/BCl_3 mixture. However the etched morphology exhibited roughness around 40 nm Ra (arithmetic average deviation from center line) because of different etching rates for Al_2O_3 and TiC grains in the substrate. The addition of Ar to the Cl_2/BCl_3 improved both the etching rate and roughness of the etched surface considerably. As a result the high etching rate of more than 350 nm/min, which is more than ten times that of conventional Ar^+ ion etchin, and relatively smooth surface roughness around 20 nm Ra were achieved with Ar/Cl_2/BCl3 mixture using 1.2 kW RF power and -500 V V_<dc>.
社団法人応用物理学会の論文
1996-04-30