Shimada Toshikazu | Central Research Laboratory
スポンサーリンク
概要
関連著者
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Shimada Toshikazu
Central Research Laboratory
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SHIMADA Toshikazu
Central Research Laboratory, Hitachi Ltd.
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Shimada Toshikazu
Electronics Research Laboratory Nissan Motor Co. Ltd.
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Shimada T
Presto Japan Science And Technology Corporation (jst) And Department Of Chemistry The University Of
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Watanabe Teruo
Futaba Corporation
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Watanabe T
Components Development Group Sony Corporation
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Watanabe T
Ritsumeikan Univ. Shiga Jpn
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Watanabe T
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Watanabe Toshihide
Atr Adaptive Communications Research Laboratories:(present Address)science And Technical Research La
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Muramatsu S
Univ. Tokyo Tokyo Jpn
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WATANABE Takeshi
Production Engineering Research Laboratory, Hitachi, Ltd.
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Muramatsu S
Hitachi Cable Ltd. Ibaraki Jpn
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Watanabe Tetsu
Components Development Group Sony Corporation
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MURAMATSU Shin-ichi
Central Research Laboratory
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Azuma K
Department Of Electric Engineering Himeji Institute Of Technology
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MATSUBARA Sunao
Central Research Laboratory, Hitachi Ltd.
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AZUMA Kazufumi
Production Engineering Research Laboratory, Hitachi, Ltd.
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Matsubara Sunao
Central Research Laboraotry
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Azuma Kazufumi
Production Engineering Research Laboratory, Hitachi Ltd. (Present address)Data Strage and Retrieval Systems Division, Hitachi, Ltd.
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NAKATANI Mitsuo
Production Engineering Research Laboratory, Hitachi, Ltd.
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KATAYAMA Yoshifumi
Central Research Laboratory, Hitachi Ltd.
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Katayama Yoshifumi
Central Research Laboratory
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Nakatani Mitsuo
Production Engineering Research Laboratory Hitachi Ltd.
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Itoh Hisayoshi
Institute Of Materials Science University Of Tsukuba
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Itoh H
Semiconductor Academic Research Center
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Itoh Hitoshi
Semiconductor Academic Research Center
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ITOH Haruo
Central Research Laboratory, Hitachi Lid.
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SONOBE Tadashi
Hitachi Works, Hitachi, Ltd.,
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Sonobe T
Hitachi Works Hitachi Ltd.
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Sonobe Tadashi
Hitachi Ltd. Hitachi Works.
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Itoh Haruo
Central Research Laboratory Hitachi Ltd.
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NAKAGAWA Kiyokazu
Center for Crystal Science and Technology, University of Yamanashi
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Tanaka M
Production Engineering Research Laboratory Hitachi Ltd.
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Suzuki Kenji
Institute For Materials Research Laboratory Tohoku University
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Kurihara Koji
Faculty Of Technology Tokyo University Of Agricuture And Technology
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Usami Katsuhisa
Hitachi Research Laboratory Hitachi Ltd.
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Nishida Akio
Central Research Laboratory Hitachi Ltd.
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NAGAYOSHI Hiroshi
Division of Electronic and Information Engineering, Faculty of Technology, Tokyo University of Agric
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KAMISAKO Koichi
Division of Electronic and Information Engineering, Faculty of Technology, Tokyo University of Agric
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KUROIWA Koichi
Division of Electronic and Information Engineering, Faculty of Technology, Tokyo University of Agric
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TARUI Yasuo
Division of Electronic and Information Engineering, Faculty of Technology, Tokyo University of Agric
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NAKAGAWA Kiyokazu
Central Research Laboratory, Hitachi Ltd.
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Tanaka M
Toshiba Corp. Kawasaki Jpn
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NAGAYOSHI Hiroshi
Faculty of Technology, Tokyo University of Agriculture and Technology
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Nakagawa Kenichi
Liquid Ctystal Laboratories Sharp Corporation
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Tanaka M
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Tarui Yasuo
Division Of Electronic And Information Engineering Faculty Of Technology Tokyo University Of Agricul
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Nishida A
Hitachi Ltd. Tokyo Jpn
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Kamisako K
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Kuroiwa K
Faculty Of Technology Tokyo University Of Agricuture And Technology
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TARUI Yasuo
National Institute of Advanced Industrial science and Technology
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TANAKA Masahiro
Production Engineering Research Laboratory, Hitachi, Ltd.,
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Suzuki K
横浜国大 大学院工学研究院
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Kamisako Koichi
Division Of Electronic And Information Engineering Faculty Of Technology Tokyo University Of Agricul
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Nakagawa K
Center For Crystal Science And Technology University Of Yamanashi
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Nagayoshi H
Faculty Of Technology Tokyo University Of Agriculture And Technology
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Nakagawa Kiyokazu
Central Research Laboratory Hitachi Ltd.
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Nakagawa Keisuke
Department Of Applied Physics Faculty Of Science Science University Of Tokyo
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SUZUKI Kenji
Institute for Materials Research, Tohoku University
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Nakamura Nobuo
Central Research Laboratory Hitachi Ltd.
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Nakamura N
Tokyo Inst. Technol. Yokohama Jpn
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Suzuki Kenji
Institute For Material Resezrch Tohoku University
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UENO Tomo
Faculty of Technology, Tokyo University of Agriculture and Technology
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Usami Katsuhisa
Central Research Laboratory Hitachi Ltd.
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Nakamura Noboru
Functional Materials Research Center Sanyo Electric Co. Ltd.
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UENO Tomo
Division of Electronic and Information Engineering, Faculty of Technology, Tokyo University of Agric
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Nakamura N
Department Of Information Processing Tokyo Institute Of Technology
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Ueno T
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Ueno Tomo
Division Of Electronic And Information Engineering Faculty Of Technology Tokyo University Of Agricul
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KAMIYAMA Tomoaki
Institute for Materials Research Laboratory, Tohoku University
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Kuwai T
Department Of Physics University Of Toyama
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鈴木 和夫
横浜大
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Shiraki Yasuhiro
Central Research Laboratory Hitachi Ltd.
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Kamiyama T
Tohoku Univ. Sendai Jpn
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Komatsubara Kiichi
Central Research Laboratory
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Shiraki Yasuhiro
Central Research Laboratory
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Suzuki Kenji
Institute For Masterials Research Tohoku University
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MATSUDA Akihisa
Electrotechnical Laboratory
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NAKAMURA Naoto
Department of Information Processing, Tokyo Institute of Technology
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Suzuki K
School Of Science And Engineering Waseda University:kagami Memorial Laboratory For Materials Science
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Kimura Yoshinobu
Central Research Laboratory Hitachi Ltd.
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OZAWA Kunio
Energy Research Laboratory of Hitachi Ltd.
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KAKIBAYASHI Hiroshi
Central Research Laboratory, Hitachi Ltd.
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Usami Katsuhisa
Hitachi Research Laboratory
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Kajiyama Hiroshi
Advanced Research Laboratory Hitachi Ltd.
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Fujimoto Fuminori
College of General Education, University of Tokyo
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Ootuka Akio
College of General Education, University of Tokyo
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Komaki Ken-ichiro
College of General Education, University of Tokyo
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WONG Chee
Division of Electronic and Information Engineering, Faculty of Technology, Tokyo University of Agric
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NOGUCHI Haruya
Division of Electronic and Information Engineering, Faculty of Technology, Tokyo University of Agric
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Hoe WONG
Division of Electronic and Information Engineering, Faculty of Technology,Tokyo University of Agricu
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MORINAKA Haruji
Division of Electronic and Information Engineering, Faculty of Technology, Tokyo Universiry of Agric
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Tanaka M
Manufacturing Development Center Mitsubishi Electric Corporation
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Suzuki K
Assoc. Super‐advanced Electronics Technol. Kanagawa Jpn
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Horigome Shinkichi
Central Research Laboratory, Hitachi Ltd.
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Watanabe Takeshi
Central Research Laboratory, Hitachi,Ltd.
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Nakamura Nobuhiro
Department Of Electronics And Information Science Faculty Of Engineering And Design Kyoto Institute
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Horigome Shinkichi
Central Research Laboratory Hitachi Ltd.
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Suzuki K
Department Of Information And Communication Technology Tokai University
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TAKEUCHI Hiroshi
Central Research Laboratory, Hitachi Ltd.
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SHIMOTSU Teruho
Central Research Laboratory, Hitachi Ltd.
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Nakagawa K
Department Of Advanced Material Science Faculty Of Engineering Kagawa University
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Hoe W
Tokyo Univ. Agriculture And Technology Tokyo
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Wong Chee
Division Of Electronic And Information Engineering Faculty Of Technology Tokyo University Of Agricul
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Tarui Y
National Institute Of Advanced Industrial Science And Technology
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Ootuka Akio
College Of Arts And Sciences University Of Tokyo
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Ozawa K
Energy Research Laboratory Hitachi Ltd.
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Ozawa Kunio
Japan Atomic Energy Research Institute
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Ozawa Kunio
Division Of Physics Japan Atomic Energy Research Institute
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Kawatsura Kiyoshi
Department Of Physics Japan Atomic Energy Research Institute
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Kawatsura Kiyoshi
Japan Atomic Energy Research Institute
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Noguchi H
Sanyo Electric Co. Ltd. Gifu Jpn
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YAMAGUCHI Hironaru
Production Engineering Research Laboratory, Hitachi, Ltd.
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EGUCHI Kinya
Production Engineering Research Laboratory, Hitachi, Ltd.
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TSUZUKU Susumu
Production Engineering Research Laboratory, Hitachi, Ltd.
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KONENKAMP Rolf
Central Research Laboratory, Hitachi Lid.
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TAKAHASHI Tetsuhiko
Central Research Laboratory, Hitachi, Ltd.
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SUZUKI Kazuo
Hitachi Works, Hitachi, Ltd.
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Konenkamp Rolf
Central Research Laboratory Hitachi Lid.:(present Address) Hahn-meitner Institute Berlin
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Saito Kazutoshi
Central Research Laboratory Hitachi Ltd.
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ISHIOKA Sachio
Central Research Laboratory
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Ishioka Sachio
Central Research Laboratory Hitachi Ltd.
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KOMAKI Ken-ichiro
University of Tokyo
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Morinaka Haruji
Faculty Of Technology Tokyo University Of Agriculture And Technology
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Tsuzuku Susumu
Production Engineering Research Laboratory Hitachi Ltd.
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Eguchi Kinya
Production Engineering Research Laboratory Hitachi Ltd.
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Ono Y
Central Research Laboratory Hitachi Ltd
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Komaki K
Univ. Tokyo
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Kuroki Kenro
Institute Of Physics Graduate School Of Arts And Sciences University Of Tokyo
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Komaki Ken-ichiro
College Of Arts And Sciences University Of Tokyo
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Shimotsu Teruho
Central Research Laboratory Hitachi Ltd.
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Takahashi Tetsuhiko
Central Research Laboratory Hitachi Ltd.
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Takahashi Tetsuhiko
Central Research Laboratory Hitachi Ltd Po Box 2
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Shimada Toshikazu
Central Research Laboratory Hitachi Ltd.
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ONO Yuichi
Central Research Laboratory, Hitachi, Ltd.
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Yamaguchi Hironaru
Production Engineering Research Laboratory Hitachi Ltd.
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Fujimoto F
Toyo Kasei Kogyo Co. Ltd. Osaka
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Fujimoto F
College Of Arts And Sciences University Of Tokyo
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Fujimoto Fuminori
College Of General Education University Of Tokyo
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Kakibayashi Hiroshi
Central Research Laboratory Hitachi Ltd
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ONO Yuich
Central Research Laboratory, Hitachi, Ltd.
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Ono Yuich
Central Research Laboratory Hitachi Ltd.
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Ono Yuichi
Central Research Laboratory Hitachi Ltd.
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Watanabe Takeshi
Central Research Laboratory Hitachi Ltd.
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Takeuchi Hiroshi
Central Research Laboratory Hitachi Ltd.
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Takeuchi Hiroshi
Central Research Lab. Hitachi Lid.
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KIMURA Yoshinobu
Central Research Laboratory, Hitachi, Ltd.
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Fujimoto Fuminori
College of Arts and Sciences,University of Tokyo
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FUJIMOTO Fuminori
College of Arts and Sciences, University of Tokyo:(Present address)Institute of Scientific and Industrial Research, Osaka University
著作論文
- Preparation of a-Si_N_x:H Film Using N_2 Microwave Afterglow Chemical Vapor Deposition Method
- Generation Mechanism of Tensile Stress in a-Si_N_x Films Prepared by Afterglow Plasma Chemical Vapor Deposition Technique
- Residual Stress of a-Si_N_x:H Films Prepared by Afterglow Plasma Chemical Vapor Deposition Technique
- Effect of Atomic and Molecular Hydrogen Irradiation on Ge Surface Segregation during Si Molecular Beam Epitaxy
- Microstructure of Visible Light Emitting Porous Silicon
- Fine Structure of Porous Si with Visible Photoluminescence
- Classification of Inhomogeneities in Hydrogenated Amorphous Silicon
- Reduction of Gap State Density in a-SiGe:H Alloys
- Mobility-Lifetime Product in Hydrogenated Amorphous Silicon
- Gap States in a-SiGe:H Examined by the Constant Photocurrent Method
- Integrated Radiation Detectors with a-Si Photodiodes on Ceramic Scintillators
- Medium-Range Order of Amorphous Silicon Germanium Alloys : Small-Angle X-Ray Scattering Study
- Influence of Deposition Conditions on Properties of a-SiGe:H Prepared by Microwave-Excited Plasma CVD : Condensed Matter
- Direct Observation of a-Si:H/a-Si_C_x:H Multilayers and Their Electrical Properties : Surfaces, Interfaces and Films
- Microwave-Excited Plasma CVD of a-Si:H Films Utilizing a Hydrogen Plasma Stream or by Direct Excitation of Silane
- Chemical Vapor Deposition of a-SiGe:H Films Utilizing a Microwave-Excited Plasma
- Chemical Vapor Deposition of a-Si:H Films Utilizing a Microwave Excited Ar Plasma Stream
- Preparation of High Purity a-Si:H Films and Their Light Soaking Effects
- Infrared Spectra of Amorphous Silicon-Fluorine Alloys Prepared by Sputtering in Fluorosilane-Argon Gas Mixture
- Stopping Cross-Sections of Rare Gases in Amorphous Silicon for MeV Energy Helium Ions
- Control of Optical Gap in a-Si_xC_: H Alloy Films Produced by Reactive Sputtering Method : II-2: AMORPHOUS FILM PREPARATION AND CHARACTERIZATION (II)
- GaAs_P_x Light Emitting Diodes Produced by Zn Ion Implantation. : I. Dose Dependence of Properties of Implanted Diodes
- On the Phase Transition-Like Structure Change of Disordered Lattice State of GaP (Selected Topics in Semiconductor Physics) -- (Impurity and Disordered States)
- GaAs_P_x Light Emitting Diodes Produced by Zn Ion Implantation. : II. Photoluminescence of p-Type Layers Formed by Ion Implantation and Diffusion
- XPS Determination of Amount of Incorporated Rare Gas in Amorphous Silicon Films Produced with Reactive Sputtering Method
- Observation of Si-2p Level Shift in Hydrogenated Amorphous Silicon by X-Ray Photoelectron Spectroscopy