Influence of Ion Energy on Carrier Activation and Source/Drain Parasitic Resistance in Low-Energy Ion Implantation for 0.15-μm MOSFETs
スポンサーリンク
概要
- 論文の詳細を見る
- 1996-08-26
著者
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Nishida Akio
Central Research Laboratory Hitachi Ltd.
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MURAKAMI Eiichi
Central Research Laboratory, Hitachi, Ltd.
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Murakami Eiichi
Central Research Laboratory Hitachi Ltd.
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Kimura Shin'ichiro
Central Research Laboratory Hitachi Ltd.
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