Characteristics of Boron Diffusion from BSG Film and the Formation of Ultra-Shallow, Low-Resistance Junctions

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概要

• 論文の詳細を見る
• 1995-08-21

著者

• Kimura S

  Electrotechnical Lab. Ibaraki Jpn

• Murakami E

  Canon Inc. Tochigi Jpn

• Murakami Eiichi

  Central Research Laboratory Hitachi Ltd.

• KUJIRAI Hiroshi

  Central Research Laboratory, Hitachi, Ltd.

• Kujirai Hiroshi

  Central Research Laboratory Hitachi Ltd.

• Murakami E

  Nanotechnology Research Center Canon Inc.

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• Characteristics of Boron Diffusion from BSG Film and the Formation of Ultra-Shallow, Low-Resistance Junctions
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