Analysis of Stress in Laser-Crystallized Polysilicon Thin Films by Raman Scattering Spectroscopy

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2002-08-15

著者

• NAKAJIMA Kazuo

  Institute for Materials Research (IMR), Tohoku University

• KUROSAWA Toshiyuki

  Bruker AXS

• Kitahara K

  Interdisciplinary Faculty Of Science And Engineering Shimane University

• Kitahara Kuninori

  Department Of Electronic And Control Systems Engineering Shimane University

• Nakajima Kunio

  Seiko Instrumentsu Inc.

• MORITANI Akihiro

  Department of Electronic and Control Systems Engineering, Shimane University

• KUROSAWA Toshitaka

  Komatsu Ltd.

• YAMAZAKI Ryosuke

  Department of Electronic and Control System Eng., Shimane University

• Moritani A

  Department Of Electronic And Control System Eng. Shimane University

• Kitahara Kuninori

  Department Of Electronic And Control System Eng. Shimane University

• Moritani Akihiro

  Department Of Electronic And Control System Eng. Shimane University

• Yamazaki Ryosuke

  Department Of Electronic And Control System Eng. Shimane University

• Nakajima Kazuo

  Institute For Materials Research (imr) Tohoku University

• Nakajima Kazuo

  Institute For Materials Research. Tohoku University

• Nakajima Kazuo

  Institute for Materials Reseach, Tohoku University, 2-1-1 Katahira-cho, Aoba-ku, Sendai 980-8577, Japan

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