TAKEISHI Michitoshi | Institute of Applied Physics, University of Tsukuba

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概要

• 同名の論文著者
• Institute of Applied Physics, University of Tsukubaの論文著者

関連著者

• TAKEISHI Michitoshi

  Institute of Applied Physics, University of Tsukuba

• Saito Takanobu

  Institute For Materials Research

• Matsumoto Yuta

  Institute Of Applied Physics University Of Tsukuba

• Sasaki Ryo

  Institute Of Applied Physics University Of Tsukuba

• SUEMASU Takashi

  Institlite of Materials Science, University of Tsukuba

• USAMI Noritaka

  Institute for Materials Research, Tokoku University

• Usami Noritaka

  Institute Of Materials Research Tohoku University

• Usami Noritaka

  Institute For Material Research Tohoku University

• SUEMASU Takashi

  Institute of Applied Physics, University of Tsukuba

• SAITO Takanobu

  Institute of Applied Physics, University of Tsukuba

• MATSUMOTO Yuta

  Institute of Applied Physics, University of Tsukuba

• SASAKI Ryo

  Institute of Applied Physics, University of Tsukuba

• Suemasu Takashi

  Institute Of Applied Physics University Of Tsukuba

• Tsukada Dai

  Institute Of Applied Physics University Of Tsukuba

• Saito Takanobu

  Institute Of Applied Physics University Of Tsukuba

• Takeishi Mitsutomo

  Institute Of Applied Physics University Of Tsukuba

• TSUKADA Dai

  Institute of Applied Physics, University of Tsukuba

• SUZUNO Mitsushi

  Institute of Applied Physics, University of Tsukuba

• Suzuno Mitsushi

  Institute Of Applied Physics University Of Tsukuba

• Saito Takanobu

  Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan

• Takeishi Michitoshi

  Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan

• Ootsuka Teruhisa

  Nanodevice Innovation Research Center and Nanotechnology Research Institute, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan

• Sasaki Ryo

  Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan

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著作論文

• Photoresponse Properties of Polycrystalline BaSi_2 Films Grown on SiO_2 Substrates Using (111)-Oriented Si Layers by an Aluminum-Induced Crystallization Method
• Fabrication of n^+-BaSi_2/p^+-Si Tunnel Junction on Si(111) Surface by Molecular Beam Epitaxy for Photovoltaic Applications
• Wet Chemical Etching and X-ray Photoelectron Spectroscopy Analysis of BaSi2 Epitaxial Films Grown by Molecular Beam Epitaxy

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