TSUKADA Dai | Institute of Applied Physics, University of Tsukuba
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概要
関連著者
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TSUKADA Dai
Institute of Applied Physics, University of Tsukuba
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MATSUMOTO Yuta
Institute of Applied Physics, University of Tsukuba
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Tsukada Dai
Institute Of Applied Physics University Of Tsukuba
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Matsumoto Yuta
Institute Of Applied Physics University Of Tsukuba
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USAMI Noritaka
Institute for Materials Research, Tokoku University
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Usami Noritaka
Institute Of Materials Research Tohoku University
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Usami Noritaka
Institute For Material Research Tohoku University
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SUEMASU Takashi
Institute of Applied Physics, University of Tsukuba
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KOBAYASHI Michitaka
Institute of Applied Physics, University of Tsukuba
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SAITO Takanobu
Institute of Applied Physics, University of Tsukuba
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SASAKI Ryo
Institute of Applied Physics, University of Tsukuba
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TAKEISHI Michitoshi
Institute of Applied Physics, University of Tsukuba
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Kobayashi Michitaka
Institute Of Applied Physics University Of Tsukuba
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Saito Takanobu
Institute For Materials Research
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Suemasu Takashi
Institute Of Applied Physics University Of Tsukuba
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Suemasu Takashi
Presto Japan Science And Technology Agency
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Sasaki Ryo
Institute Of Applied Physics University Of Tsukuba
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Ichikawa Yoshitake
Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennohdai, Tsukuba, Ibaraki 305-8573, Jap
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Saito Takanobu
Institute Of Applied Physics University Of Tsukuba
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Ichikawa Yoshitake
Institute Of Applied Physics University Of Tsukuba
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Takeishi Mitsutomo
Institute Of Applied Physics University Of Tsukuba
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SUEMASU Takashi
Institlite of Materials Science, University of Tsukuba
著作論文
- Photoresponse Properties of Polycrystalline BaSi_2 Films Grown on SiO_2 Substrates Using (111)-Oriented Si Layers by an Aluminum-Induced Crystallization Method
- Control of Electron and Hole Concentrations in Semiconducting Silicide BaSi2 with Impurities Grown by Molecular Beam Epitaxy