Transmission Electron Microscopy Characterization of Position-Controlled InN Nanocolumns

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概要

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• One of the ways to obtain higher quality InN crystal is through the growth of columnar nanostructure. We have successfully grown position-controlled InN nanocolumns by electron cyclotron resonance plasma-excited molecular beam epitaxy (ECR-MBE). The position-controlled InN nanocolumns were characterized by transmission electron microscope (TEM). Selected area electron diffraction (SAED) patterns showed that InN nanocolumns were epitaxially grown on the GaN template with relaxed strain. In the majority of InN nanocolumns, however, neither edge- nor screw-type threading dislocations were generated at the interface between the GaN template and InN nanocolumns. Furthermore, various behaviors of threading dislocations in GaN template at the interface were observed. Finally, we carried out polarity determination for InN nanocolumns using convergent beam electron diffraction (CBED) technique and confirmed that InN nanocolumns have In-polarity.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2008-07-25

著者

• Miyake Hideto

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Mie University

• Nanishi Yasushi

  Department Of Photonics Faculty Of Science And Engineering Ritsumeikan University

• Hiramatsu Kazumasa

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Mie University

• Araki Tsutomu

  Department Of Applied Physics Faculty Of Engineering Osaka University

• Akagi Takanobu

  Department of Photonics, Ritsumeikan University, Kusatsu, Shiga 525-8577, Japan

• Miyake Hideto

  Department of Electrical and Electronic Engineering, Mie University, Tsu 514-8507, Japan

• Hiramatsu Kazumasa

  Department of Electrical and Electronic Engineering, Mie University, Tsu 514-8507, Japan

• Harui Satoshi

  Department of Photonics, Ritsumeikan University, Kusatsu, Shiga 525-8577, Japan

• Tamiya Hidetoshi

  Department of Photonics, Ritsumeikan University, Kusatsu, Shiga 525-8577, Japan

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