Injection-Activated Defect-Governed Recombination Rate in InN
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概要
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Excess carrier dynamics was investigated by free-carrier absorption and light-induced transient grating techniques in InN layers with residual electron density varying from n_{0}=1.4\times 10^{18} to 4.7\times 10^{18} cm<sup>-3</sup>in a wide excitation range (up to 10^{20} cm<sup>-3</sup>). Carrier lifetime \tau decreased with injected carrier density \Delta N\geq n_{0} and followed the same inverse relationship as on residual electron density \tau \propto[B(n_{0}+\Delta N)]^{-1}, thus confirming defect-related recombination mechanism. Its nonradiative origin was verified by \tau(T) measurements and ascribed to injection-enhanced nonlinear recombination via defect-assisted Auger recombination with C_{\text{TAAR}}= B/N_{\text{T}}=(4.5\pm 2)\times 10^{-28} cm<sup>6</sup>/s, assuming the defect density N_{\text{T}} being equal to electron density. Oxygen or hydrogen impurities are proposed as possible candidates for traps assisting in Auger process.
- 2013-08-25
著者
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Yamaguchi Tomohiro
Department Of Applied Chemistry Faculty Of Engineering Kumamoto University
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Nanishi Yasushi
Department Of Photonics Faculty Of Science And Engineering Ritsumeikan University
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Jarasiunas Kestutis
Institute Of Material Science And Applied Research Vilnius University
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Sakalauskas Egidijus
Institut für Physik, Technische Universität Ilmenau, PF100565, 98684 Ilmenau, Germany
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Nargelas Saulius
Institute of Applied Research, Vilnius University, 10222 Vilnius, Lithuania
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Vengris Mikas
Laser Research Center, Vilnius University, 10223 Vilnius, Lithuania
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