High-Quality Silicon Oxide Film Formed by Diffusion Region Plasma Enhanced Chemical Vapor Deposition and Oxygen Radical Treatment Using Microwave-Excited High-Density Plasma
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概要
- 論文の詳細を見る
In this study, we present the results on silicon oxide films deposited using a Kr/O2/SiH4 high-density and low-ion-energy plasma at low temperature (400°C). The results demonstrate that the post-treatment using the Kr/O2 plasma can eliminate bulk traps related to hydroxylic groups in the films. The silicon oxide films deposited using the high-density low-ion-energy Kr/O2/SiH4 plasma exhibit excellent properties, e.g., low fixed charge density ($4 \times 10^{10}$ cm-2) and high breakdown electric field (${>}12$ MV/cm) and high charge-to-breakdown. Those properties of the deposited films have approached the electrical characteristics of high temperature thermal oxide films. On a poly-Si substrate, a plasma enhanced chemical vapor deposition (PECVD) silicon oxide film that has a high breakdown field and low leakage current is also obtained.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-04-15
著者
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Sugawa Shigetoshi
Graduate School Of Engineering Tohoku University
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Hirayama Masaki
New Industry Creation Hatchery Center Tohoku University
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Hayakawa Yukio
New Industry Creation Hatchery Center Tohoku University
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Chuanjie Zhong
New Industry Creation Hatchery Center Tohoku University
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Teramoto Akinobu
New Industry Creation Hatchery Center Tohoku Univ.
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Tanaka Hiroaki
Graduate School Of Engineering The University Of Tokyo
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Ohmi Tadahiro
New Industry Creation Hatchery Center (niche) Tohoku University
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Teramoto Akinobu
New Industry Creation Hatchery Center, Tohoku University, Aza-Aoba 04, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Teramoto Akinobu
New Industry Creation Hatchery Center (NICHe), Tohoku University, Sendai 980-8579, Japan
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Chuanjie Zhong
New Industry Creation Hatchery Center, Tohoku University, Aza-Aoba 04, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Hayakawa Yukio
New Industry Creation Hatchery Center, Tohoku University, Aza-Aoba 04, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Sugawa Shigetoshi
Graduate School of Engineering, Tohoku University, Aza-Aoba 05, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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