Infrared Complex Dielectric Function Analysis for Chemical Bonding Structure of Porous Silica Low Dielectric Constant Films

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概要

• 論文の詳細を見る
• 2005-09-13

著者

• KIKKAWA Takamaro

  MIRAI, Advanced Semiconductor Research Center, AIST

• 吉川 公麿

  広島大学:産業総合研究所

• HATA Nobuhiro

  ASRC, AIST

• NAKAYAMA Takahiro

  MIRAI-ASET

• FUJII Nobutoshi

  MIRAI-ASET

• Hata Nobuhiro

  Asrc Aist

• Hata Nobuhiro

  Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And

• Hata Nobuhiro

  Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Science And Technology

• Kikkawa Takamaro

  Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And

• Kikkawa Takamaro

  Mirai Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Scienc

• Takada Syozo

  Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol

• TAKADA Syozo

  ASRC, AIST

• HISHIYA Shingo

  MIRAI, ASET

• Takada Syozo

  Asrc Aist

• Takada Syozo

  Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Science And Technology

• Kikkawa Takamaro

  Millenium Research For Advanced Information Technology (mirai)-asrc Aist

• Hata Nobuhiro

  Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol

• Hishiya Shingo

  Mirai Aset

• Nakayama Takahiro

  MIRAI, Association of Super-Advanced Electronics Technologies (ASET), Tsukuba, Ibaraki 305-8569, Japan

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