Determination of mechanical properties of porous silica low-k films on Si substrates using orientation dependence of surface acoustic wave
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概要
- 論文の詳細を見る
- 2007-09-19
著者
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Hata Nobuhiro
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And
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Hata Nobuhiro
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Science And Technology
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TAKADA Syozo
Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and
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Yoshino Takenobu
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And
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Yoshino Takenobu
Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol
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Takimura Toshinori
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Science And Technology
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Takada Syozo
Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol
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Takada Syozo
Asrc Aist
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Takada Syozo
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Science And Technology
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Hata Nobuhiro
Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol
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