Effect of Phosphorus Atom in Self-Assembled Monolayer as a Drift Barrier for Advanced Copper Interconnects

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概要

• 論文の詳細を見る
• 2008-06-25

著者

• 吉川 公麿

  広島大学:産業総合研究所

• Hata Nobuhiro

  Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And

• Hata Nobuhiro

  Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Science And Technology

• Yoshino Takenobu

  Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And

• Kikkawa Takamaro

  Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And

• MACHIDA Hideaki

  Tri Chemical Laboratory Inc.

• Machida Hideaki

  Tri Chemical Laboratories Inc.

• MURAMOTO Ikuyo

  Tri Chemical Laboratories Inc.

• Kikkawa Takamaro

  Millenium Research For Advanced Information Technology (mirai)-asrc Aist

• Hata Nobuhiro

  Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol

• Machida Hideaki

  TRI Chemical Lab. Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan

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