Composition control of Ni-silicide by CVD using Ni(PF_3)_4 and Si_3H_8

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概要

• 論文の詳細を見る
• 2005-09-13

著者

• Ogura Atsushi

  Meiji University

• MACHIDA Hideaki

  Tri Chemical Laboratory Inc.

• Ogura A

  Meiji University

• OHSHITA Yoshio

  Toyota Technological Institute

• Machida Hideaki

  Tri Chemical Laboratories Inc.

• MURAMOTO Ikuyo

  Tri Chemical Laboratories Inc.

• Ishikawa Masato

  Tri Chemical Laboratories Inc., 8154-217 Uenohara, Uenohara, Yamanashi 409-0112, Japan

• Imai Satoshi

  Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki 214-8571, Japan

• OHSIHITA Yoshio

  Toyota Technological Institute

• Imai Satoshi

  Meiji University

• Ishikawa Masato

  Tri Chemical Laboratories Inc.

• Ogura Atsushi

  Meiji Univ. Kawasaki Jpn

• Ishikawa Masato

  TRI Chemical Lab. Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan

• Machida Hideaki

  TRI Chemical Lab. Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan

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