Ishikawa Masato | Tri Chemical Laboratories Inc., 8154-217 Uenohara, Uenohara, Yamanashi 409-0112, Japan
スポンサーリンク
概要
関連著者
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MACHIDA Hideaki
Tri Chemical Laboratory Inc.
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Ogura A
Meiji University
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OHSHITA Yoshio
Toyota Technological Institute
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Ishikawa Masato
Tri Chemical Laboratories Inc., 8154-217 Uenohara, Uenohara, Yamanashi 409-0112, Japan
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Ogura Atsushi
Meiji University
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Machida Hideaki
Tri Chemical Laboratories Inc.
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Ishikawa Masato
Tri Chemical Laboratories Inc.
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Ogura Atsushi
Meiji Univ. Kawasaki Jpn
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Ishikawa Masato
TRI Chemical Lab. Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
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Machida Hideaki
TRI Chemical Lab. Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
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Kada Takeshi
Tri Chemical Laboratory Inc.
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MURAMOTO Ikuyo
Tri Chemical Laboratories Inc.
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Imai Satoshi
Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki 214-8571, Japan
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Imai Satoshi
Meiji University
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Ohshita Yoshio
Toyota Technological Inst. Nagoya Jpn
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Ogura Atsushi
Silicon Systems Research Laboratories Nec Corporation
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OHSIHITA Yoshio
Toyota Technological Institute
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Kada Takeshi
Tri Chemical Laboratories Inc.
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Kada Takeshi
TRI Chemical Lab. Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
著作論文
- Composition Control of Ni Silicide by Chemical Vapor Deposition Using Ni(PF3)4 and Si3H8
- Composition control of Ni-silicide by CVD using Ni(PF_3)_4 and Si_3H_8
- Ni Thin Film Deposition from Tetrakistrifluorophosphine-Nickel
- Vapor Pressure of Hf and Si Precursors for Hf_xSi_O_2 Deposition Evaluated by a Saturated Gas Technique