Kada Takeshi | Tri Chemical Laboratory Inc.
スポンサーリンク
概要
関連著者
-
MACHIDA Hideaki
Tri Chemical Laboratory Inc.
-
Kada Takeshi
Tri Chemical Laboratory Inc.
-
Ogura A
Meiji University
-
OHSHITA Yoshio
Toyota Technological Institute
-
Ishikawa Masato
Tri Chemical Laboratories Inc., 8154-217 Uenohara, Uenohara, Yamanashi 409-0112, Japan
-
Ogura Atsushi
Meiji University
-
Ogura Atsushi
Silicon Systems Research Laboratories Nec Corporation
-
Machida Hideaki
Tri Chemical Laboratories Inc.
-
Kada Takeshi
Tri Chemical Laboratories Inc.
-
Ishikawa Masato
Tri Chemical Laboratories Inc.
-
Ohshita Yoshio
Toyota Technological Inst. Nagoya Jpn
-
Ogura Atsushi
Meiji Univ. Kawasaki Jpn
-
Ishikawa Masato
TRI Chemical Lab. Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
-
Kada Takeshi
TRI Chemical Lab. Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
-
Machida Hideaki
TRI Chemical Lab. Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
著作論文
- Ni Thin Film Deposition from Tetrakistrifluorophosphine-Nickel
- Vapor Pressure of Hf and Si Precursors for Hf_xSi_O_2 Deposition Evaluated by a Saturated Gas Technique