Machida Hideaki | Tri Chemical Laboratories Inc.
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概要
関連著者
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Machida Hideaki
Tri Chemical Laboratories Inc.
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Machida Hideaki
TRI Chemical Lab. Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
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MACHIDA Hideaki
Tri Chemical Laboratory Inc.
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Ishikawa Masato
Tri Chemical Laboratories Inc.
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Ishikawa Masato
TRI Chemical Lab. Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
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Ohshita Yoshio
Toyota Technological Inst. Nagoya Jpn
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Kada Takeshi
Tri Chemical Laboratories Inc.
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Kada Takeshi
TRI Chemical Lab. Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
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Ogura Atsushi
Meiji University
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Ogura A
Meiji University
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OHSHITA Yoshio
Toyota Technological Institute
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MURAMOTO Ikuyo
Tri Chemical Laboratories Inc.
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Ishikawa Masato
Tri Chemical Laboratories Inc., 8154-217 Uenohara, Uenohara, Yamanashi 409-0112, Japan
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Ogura Atsushi
Meiji Univ. Kawasaki Jpn
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Imai Satoshi
Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki 214-8571, Japan
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Imai Satoshi
Meiji University
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Ogura Atsushi
Silicon System Research Labs., NEC Corp., 1120 Shimokuzawa, Sagamihara 229-1198, Japan
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OGINO Kenji
Graduate School of Bio-applications and System Engineering, Tokyo University of Agriculture & Techno
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吉川 公麿
広島大学:産業総合研究所
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Hata Nobuhiro
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And
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Hata Nobuhiro
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Science And Technology
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MIYATA Seizo
Graduate School of Bio-Application and Systems Engineering, Tokyo University of Agriculture and Tech
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Ogino Kenji
Graduate School Of Bio-applications And System Engineering Tokyo University Of Agriculture & Tec
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Yoshino Takenobu
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And
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HASEGAWA Fumio
Institute of Applied Physics, University of Tsukuba
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Oyama Noboru
Department Of Applied Chemistry Faculty Of Technology Tokyo University Of Agriculture And Technology
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Hatozaki Osamu
Department Of Applied Chemistry Faculty Of Technology Tokyo University Of Agriculture And Technology
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Kikkawa Takamaro
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And
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KADA Takeshi
Graduate School of Bio-Applications and Systems Engineering, Tokyo Univ. of Agriculture and Technolo
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HIRAMATSU Takeyoshi
Graduate School of Bio-Applications and Systems Engineering, Tokyo Univ. of Agriculture and Technolo
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LIANG Chuang
Optical New Material group, Japan Science and Technology Corp.
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KISO Koichi
Tri Chemical Laboratory Inc.
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Liang Chuang
Optical New Material Group Japan Science And Technology Corp.:tri Chemical Laboratory Inc.
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Kada Takeshi
Tri Chemical Laboratory Inc.
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Kada Takeshi
Graduate School Of Bio-applications And Systems Engineering Tokyo Univ. Of Agriculture And Technolog
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Miyata Seizo
Graduate School Of Bio-applications And Systems Engineering Tokyo Univ. Of Agriculture And Technolog
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Hasegawa Fumio
Institute Of Applied Physics University Of Tsukuba
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Ishikura K
Institute Of Materials Science University Of Tsukuba
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Ishikura Kouji
Institute Of Materials Science University Of Tsukuba
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TAKEUCHI Atsushi
Institute of Materials Science, University of Tsukuba
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KURIHARA Megumu
Tri Chemical Laboratory Inc.
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Kimura Takafumi
Fujitsu Ltd.
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Kimura Takafumi
Fujitsu Laboratories Lid.
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OHSIHITA Yoshio
Toyota Technological Institute
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Miyata Seizo
Graduate School Of Bio-application And Systems Engineering Tokyo University Of Agriculture And Techn
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Ogura Atsushi
Silicon Systems Research Laboratories Nec Corp.
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Ogura Atsushi
Nec Corp. Microelectronics Research Laboratories
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Kikkawa Takamaro
Millenium Research For Advanced Information Technology (mirai)-asrc Aist
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Ogino Kenji
Graduate School Of Bio-applications And Systems Engineering Tokyo Univ. Of Agriculture And Technolog
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Hata Nobuhiro
Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol
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MIHASHI Satoru
Department of Applied Chemistry, Faculty of Technology, Tokyo University of Agriculture and Technolo
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YAMAUCHI Hideaki
Fujitsu Ltd.
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KOKUBUN Hiroshi
Tri Chemical Laboratory Inc.
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YAMADA Masao
Fujitsu Ltd.
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Mihashi Satoru
Department Of Applied Chemistry Faculty Of Technology Tokyo University Of Agriculture And Technology
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Hiramatsu Takeyoshi
Graduate School Of Bio-applications And Systems Engineering Tokyo Univ. Of Agriculture And Technolog
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Takeuchi Atsushi
Institute Of Materials Science University Of Tsukuba
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Ogura Atsushi
Silicon Systems Research Labs, NEC Corporation, 1120 Shimokuzawa, Sagamihara-shi, Kanagawa 229-1198, Japan
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Ogura Atsushi
Silicon Systems Research Lab., NEC Corp., 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Ogura Atsushi
NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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HASEGAWA Fumio
Institlite of Materials Science, University of Tsukuba
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Ishikawa Masato
Tri Chemical Laboratories Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
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Ishikawa Masato
TRI Chemical Laboratory Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
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Kada Takeshi
Tri Chemical Laboratories Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
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Kada Takeshi
TRI Chemical Laboratory Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
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Machida Hideaki
Tri Chemical Laboratories Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
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Machida Hideaki
TRI Chemical Laboratory Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
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MACHIDA Hideaki
TRI Chemical Laboratory INC.,
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Ogino Kenji
Graduate School of Bio-Application and Systems Engineering, Tokyo University of Agriculture and Technology, 2-24-16 Naka-cho, Koganei, Tokyo 184-8588, Japan
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三橋 智
Department of Applied Chemistry, Faculty of Technology, Tokyo University of Agriculture and Technology
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町田 英明
TRI Chemical Laboratory INC.,
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波戸崎 修
Department of Applied Chemistry, Faculty of Technology, Tokyo University of Agriculture and Technology
著作論文
- Effect of Phosphorus Atom in Self-Assembled Monolayer as a Drift Barrier for Advanced Copper Interconnects
- ポリアニリンによる2,5-ジメルカプト-1,3,4-チアジアゾールの電気化学触媒的酸化反応-1.ポリアニリンモデル化合物としてのN,N'-ジフェニル-p-フェニレンジアミンの利用
- Fabrication of Refractive Index Profiles in Poly (Methyl Methacrylate) using Ultraviolet Rays Irradiation
- Growth Condition Dependence of Carbon Reduction in GaAs Chemical Beam Epitaxy Using Trisdimethylamimo-Arsine and Trimethylgallium
- Composition Control of Ni Silicide by Chemical Vapor Deposition Using Ni(PF3)4 and Si3H8
- Composition control of Ni-silicide by CVD using Ni(PF_3)_4 and Si_3H_8
- Ni Thin Film Deposition from Tetrakistrifluorophosphine-Nickel
- Synthesis of Novel Sr Sources for Metalorganic Chemical Vapor Deposition of SrTiO_3 ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Tris-diethylamino-silane Decomposition due to Tetrakis-diethylamido-hafnium in Hf1-xSixO2 Chemical Vapor Deposition
- Ni Precursor for Chemical Vapor Deposition of NiSi
- Vapor Pressure of Hf and Si Precursors for HfxSi1-xO2 Deposition Evaluated by a Saturated Gas Technique