Ogura Atsushi | Nec Corp. Microelectronics Research Laboratories
スポンサーリンク
概要
関連著者
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Ogura Atsushi
Nec Corp. Microelectronics Research Laboratories
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Ogura Atsushi
Nec Corporation
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Ogura Atsushi
Nec Corporation Microelectronics Research Laboratories
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Machida Hideaki
Tri Chemical Laboratories Inc.
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Kada Takeshi
Tri Chemical Laboratories Inc.
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Ishikawa Masato
Tri Chemical Laboratories Inc.
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Ohshita Yoshio
Toyota Technological Inst. Nagoya Jpn
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Ogura Atsushi
NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Ishikawa Masato
TRI Chemical Lab. Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
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Ishikawa Masato
TRI Chemical Laboratory Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
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Kada Takeshi
TRI Chemical Lab. Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
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Kada Takeshi
TRI Chemical Laboratory Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
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Machida Hideaki
TRI Chemical Lab. Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
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Machida Hideaki
TRI Chemical Laboratory Inc., 8154-217 Uenohara, Uenohara-machi, Kitatsuru-gun, Yamanashi 409-0112, Japan
著作論文
- Thinning of SOI Bonded Wafers by Applying Voltage during KOH Etching: Improvement of Thickness Variation by Reducing Leakage Current
- Control of Thickness Variation in Si-on-Insulator Bonded Wafers by Applying Voltage during KOH Etching
- Tris-diethylamino-silane Decomposition due to Tetrakis-diethylamido-hafnium in Hf1-xSixO2 Chemical Vapor Deposition