Hata Nobuhiro | Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol
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概要
- 同名の論文著者
- Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technolの論文著者
関連著者
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Hata Nobuhiro
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Science And Technology
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Hata Nobuhiro
Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol
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吉川 公麿
広島大学:産業総合研究所
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Hata Nobuhiro
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And
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Kikkawa Takamaro
Millenium Research For Advanced Information Technology (mirai)-asrc Aist
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Kikkawa Takamaro
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And
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KIKKAWA Takamaro
MIRAI, Advanced Semiconductor Research Center, AIST
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Hata Nobuhiro
Asrc Aist
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Kikkawa Takamaro
Mirai Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Scienc
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FUJII Nobutoshi
MIRAI-ASET
著作論文
- Plasma-enhanced polymerization thin films as a drift barrier for Cu interconnects
- Mechanical Strength of Multilayered Dielectric Structures Measured by Laser-Pulse Generated Surface-Acoustic-Wave Technique
- Mechanical Property Determination of Thin Porous Low-k Films by Twin-Transducer Laser Generated Surface Acoustic Waves
- Theoretical Analysis of Elastic Modulus and Dielectric Constant for Low-k Two-Dimensional Periodic Porous Silica Films
- Effect of Phosphorus Atom in Self-Assembled Monolayer as a Drift Barrier for Advanced Copper Interconnects
- Influences of Skeletal Structure and Porosity on Dielectric and Mechanical Properties of Porous Organosilica Low-k Films
- Determination of mechanical properties of porous silica low-k films on Si substrates using orientation dependence of surface acoustic wave
- Nondestructive characterization of dielectric stack structures by laser-pulse-generated surface acoustic wave analysis
- The structural origin of determining the coefficient of thermal expansion for porous silica low-k films
- Nondestructive characterization of temperature-dependent backbone Si-O-Si structure in porous silica films by in-situ Fourier-transform infrared spectroscopy