Comparison of Pore Shape Models for Small Angle X-ray Scattering of a Disordered Porous Silica Low-k Film

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概要

• 論文の詳細を見る
• 2005-09-13

著者

• 吉川 公麿

  広島大学:産業総合研究所

• FUJII Nobutoshi

  MIRAI-ASET

• Hata Nobuhiro

  Asrc Aist

• Hata Nobuhiro

  Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And

• Hata Nobuhiro

  Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Science And Technology

• Hata Nobuhiro

  Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol

• Kikkawa Takamaro

  Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And

• KIKKAWA Takamaro

  Millennium Research for Advanced Information Technology (MIRAI)-ASRC, AIST

• KUNISHIGE Naoko

  Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Science and Technology

• Kikkawa Takamaro

  Millenium Research For Advanced Information Technology (mirai)-asrc Aist

• Hata Nobuhiro

  Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol

• Kunishige Naoko

  Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Science And Technology

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